Tube Furnace
Rapid Thermal Processing Furnace 1100C Atmosphere Controlled Bottom Loading RTP System for Wafer Annealing and Catalysis Research
Item Number: TU-C30
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Product Overview
This high-performance thermal processing system is engineered for Rapid Thermal Processing (RTP) applications requiring extreme temperature gradients and precise atmosphere management. By utilizing shortwave infrared technology and an automated bottom-loading configuration, the unit provides a versatile platform for advanced material research, specifically where rapid heating and cooling cycles are critical for maintaining microstructure integrity and achieving unique phase transformations. The bottom-loading design ensures easy sample handling and minimal thermal disturbance to the heating zone during loading and unloading cycles.
Target industries include semiconductor manufacturing, material science research, and catalyst development. The equipment excels in environments where high-throughput is essential, offering seamless integration with robotic handling systems for autonomous operation. This ensures that complex thermal profiles are executed with repeatable precision, reducing human error and increasing lab productivity. Whether used for silicon wafer annealing or the synthesis of advanced catalysts, the system provides the thermal flexibility required for cutting-edge innovation.
Built with industrial-grade components and a dual-layer cooling architecture, this furnace guarantees stability under demanding duty cycles. Its robust design is matched by sophisticated software control, providing the reliability required for sensitive industrial processes and high-stakes R&D projects. The combination of high-purity alumina fiber insulation and an efficient air-cooling system ensures that the equipment remains a dependable asset in any laboratory or pilot production environment.
Key Features
- Ultra-Fast Infrared Heating: Twelve shortwave infrared lamps deliver rapid heating rates up to 50°C/s, allowing for precise control over thermal kinetics during rapid annealing processes and minimizing unwanted diffusion.
- Automated Bottom-Loading Mechanism: The motorized sample stage facilitates smooth, vibration-free loading and unloading, ensuring sample stability and enabling effortless integration with external automation and robotic arms.
- Advanced Atmosphere Control: Integrated mass flow controllers and high-precision vacuum gauges allow for stable micro-positive pressure management (103,000–120,000 Pa) and complex gas purging sequences for protective atmosphere sintering.
- Precision PID Temperature Regulation: An intelligent 50-segment programmable controller maintains temperature accuracy within ±1°C, with optional upgrades to ±0.1°C for ultra-high precision laboratory requirements.
- High-Throughput Robotic Compatibility: The system is designed to communicate with robotic arms via open-source protocols and TCP/IP, supporting continuous, multi-unit autonomous operation for scaled-up processing.
- Efficient Thermal Management: A dual-layer chamber design featuring an active air-cooling system keeps the outer shell safe to touch while protecting internal electronics during high-temperature runs.
- Comprehensive Data Acquisition: Dedicated software records and displays real-time pressure, temperature, and gas flow data, ensuring full traceability and data logging for quality control and research documentation.
- Industrial-Grade Sealing: The stainless steel water-cooled flange system preserves vacuum integrity and atmosphere purity, ensuring consistent results even when operating at the maximum temperature of 1100°C.
- Versatile Sample Stage: Featuring a high-purity quartz tube and a customizable sample stage, the equipment accommodates various sample sizes including wafers up to 6 inches for diverse research needs.
Applications
| Application | Description | Key Benefit |
|---|---|---|
| Semiconductor Wafer Annealing | Rapidly heating silicon or compound semiconductor wafers up to 6" to activate dopants or repair crystal damage. | Minimal thermal budget and precise crystal lattice restoration. |
| Single-Atom Catalysis | High-temperature treatment of precursor materials to synthesize and stabilize single-atom catalysts on various substrates. | Exceptional uniformity and control over atomic-scale transformations. |
| High-Throughput Sintering | Utilizing robotic arms to process multiple samples in rapid succession for material library screening. | Significantly reduced cycle times and increased research velocity. |
| Thin Film Crystallization | Fast thermal processing of functional thin films to enhance electrical and optical properties. | Controlled grain growth and superior film quality. |
| Vacuum Heat Treatment | Processing sensitive materials under controlled vacuum levels (up to 10⁻⁴ Torr) to prevent oxidation. | High purity environment for oxygen-sensitive materials. |
| Material Phase Evolution | Studying the rapid transformation of materials under extreme temperature changes. | Highly repeatable heating and cooling rates for kinetic studies. |
| Autonomous Pilot Production | Integration into automated lines for the production of specialized electronic components. | Reduced labor costs and improved process consistency. |
Technical Specifications
| Feature | Specification Details (TU-C30) |
|---|---|
| Model Identifier | TU-C30 |
| Power Supply | Three-phase AC 208V, 50/60Hz |
| Maximum Power | 18 kW |
| Maximum Operating Temperature | 1100°C (≤ 30 minutes) |
| Long-Term Operating Temperature | 1000°C |
| Heating Element | 12 shortwave infrared lamps, 1.5 kW per lamp |
| Heating Zone Dimensions | Φ210mm × 100mm |
| Heating Rate (RT to 900°C) | Recommended: 10°C/s; Maximum: 50°C/s |
| Cooling Rate (Sealed) | 800°C to 350°C: 55°C/min; 350°C to 200°C: 5°C/min |
| Cooling Rate (Open Chamber) | 800°C to 350°C: 200°C/min; 350°C to 50°C: 35°C/min |
| Temperature Control | PID Automatic Control, 50-segment programmable |
| Temperature Accuracy | ±1°C (Optional Eurotherm Upgrade: ±0.1°C) |
| Thermocouple Type | K-type |
| Vacuum Integrity | 10⁻² Torr (Mechanical Pump) to 10⁻⁴ Torr (Molecular Pump) |
| Chamber Material | High-purity Alumina Fiber Insulation |
| Tube Material | Φ200mm High-purity Quartz Tube |
| Sample Stage | Φ105mm with 76×58mm recess (customizable) |
| Mass Flow Controller (MFC) | Range: 0-5000 sccm |
| Atmosphere Control | Micro-positive pressure (103,000–120,000 Pa) |
| Interface & Data | DB9 PC Communication, TCP/IP, Modbus, Wireless |
| Software Capabilities | Remote control of vacuum, gas flow, and thermal cycles; Multi-unit support |
| Optional Robotic System | 5kg load, 1096mm reach, ±0.02mm repeatability |
| Water Chiller (Optional) | 51880 BTU/h cooling capacity; 3-phase power |
Why Choose TU-C30
- Unmatched Thermal Performance: The combination of 18kW shortwave infrared heating and advanced PID control allows the equipment to achieve heating rates that exceed traditional resistance furnaces by an order of magnitude, making it ideal for modern material science.
- Built for Automation: Engineered specifically for high-throughput environments, this system is one of the few in its class to offer native support for robotic arm integration and multi-unit PC control, drastically reducing manual intervention.
- Superior Build Quality: From the stainless steel water-cooled flanges to the high-purity quartz internal components, every aspect of this unit is designed for long-term durability and the preservation of high-purity processing environments.
- Process Traceability: Our comprehensive software suite provides full digital records of every heating cycle, pressure change, and gas flow adjustment, satisfying the most stringent requirements for industrial quality assurance and research verification.
- Flexible Customization: Whether you require specific vacuum levels, specialized sample stages, or custom gas handling configurations, our engineering team can tailor the system to meet your exact technical requirements.
Contact our technical sales team today for a comprehensive quote or to discuss how we can customize this rapid thermal processing system for your specific research and production needs.
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