950C Rapid Thermal Processing Furnace for 12 Inch Wafer CSS Coating with Rotating Substrate Holder

Product Overview

This high-performance rapid thermal processing (RTP) and close-spaced sublimation (CSS) system represents the pinnacle of large-scale laboratory and pilot-line thermal processing. Designed specifically for the deposition of high-quality thin films and the annealing of 12-inch wafers, the equipment integrates dual-zone infrared heating with a sophisticated rotating substrate architecture. By providing a controlled environment for complex material transitions, this unit enables researchers and industrial engineers to achieve repeatable, high-fidelity results in the development of next-generation solar cells and semiconductor devices.

The system is engineered to handle demanding industrial R&D workflows, targeting advanced applications in photovoltaics, such as Cadmium Telluride (CdTe), Antimony Selenide (Sb2Se3), and Perovskite solar cells. Its primary value proposition lies in its ability to manage large-format 12-inch substrates while maintaining the thermal uniformity and rapid ramp rates required for modern thin-film synthesis. Whether utilized for rapid thermal annealing or vapor-assisted solution processes, the equipment provides a robust platform for scaling material science innovations from fundamental research to production-ready specifications.

Built with industrial-grade components and a heavy-duty stainless steel vacuum chamber, the unit ensures long-term operational reliability under high-vacuum and high-temperature conditions. The integration of precision control electronics and a water-cooled thermal management system allows for continuous operation without compromising the integrity of the internal components. This system is the ideal choice for facilities requiring a combination of large-wafer compatibility, rapid thermal response, and the high-vacuum precision necessary for high-efficiency semiconductor manufacturing.

Key Features

• Dual-Zone IR Heating Architecture: The system utilizes two independent groups of halogen infrared heaters (top and bottom) capable of reaching 950ºC. This dual-zone configuration allows for precise control of the temperature gradient, which is critical for close-spaced sublimation (CSS) processes.
• Precision Substrate Rotation: A built-in 12-inch wafer holder features an adjustable rotation mechanism (1 - 10 RPM). This ensures exceptional film thickness uniformity and structural consistency across the entire surface of large-format substrates.
• Rapid Thermal Performance: Engineered for speed, the unit can achieve heating rates up to 8ºC/s and cooling rates up to 20ºC/s. This rapid response minimizes thermal budget and allows for the precise quenching of phases in material synthesis.
• High-Vacuum Integrity: The 20-inch ID stainless steel chamber is designed to reach vacuum levels of 10^-5 Torr via a turbomolecular pump. This clean, low-pressure environment is essential for preventing oxidation and ensuring the purity of deposited thin films.
• Advanced PLC and Touchscreen Control: All operational parameters, including temperature profiles, vacuum levels, rotation speeds, and flange positioning, are managed through a centralized PLC system with a user-friendly touchscreen interface.
• Thermal Uniformity Enhancement: Graphite plates are strategically positioned over the IR heaters to serve as thermal buffers, smoothing out potential hot spots and ensuring a perfectly uniform heat distribution across the 12-inch processing area.
• Integrated Safety and Cooling: A 58L/min circulating water chiller is included to maintain the temperature of the heater jackets and chamber walls, ensuring operator safety and protecting the vacuum seals during high-temperature cycles.
• In-Situ Observation Windows: Dual 60mm diameter quartz windows allow for real-time visual monitoring of the deposition process or sample condition without breaking the vacuum or disturbing the thermal environment.
• Independent Temperature Regulation: Equipped with dual Eurotherm 3000 series digital controllers, the system offers 24-segment programming for both the top and bottom heaters, providing ±0.1ºC accuracy.
• Built-in Vapor Baffle: An air-tight sliding baffle is integrated into the chamber to block evaporation sources under high vacuum, allowing for precise control over the start and end of the deposition process.

Applications

Technical Specifications

Why Choose TU-RT33

• Unmatched Thermal Precision: The combination of dual Eurotherm controllers and IR halogen technology allows for instantaneous thermal response and extreme accuracy, ensuring your thin-film processes are perfectly repeatable.
• Scalability for Industrial Standards: While many RTP systems are limited to small coupons, this unit handles full 12-inch wafers, bridging the gap between university research and industrial semiconductor production standards.
• Robust Vacuum Performance: The heavy-duty stainless steel chamber and high-speed turbomolecular pumping system provide the ultra-clean environment necessary for high-purity semiconductor and solar cell applications.
• Comprehensive Process Control: With PLC-integrated management of rotation, temperature, and vacuum, the system minimizes human error and provides detailed data logging for quality assurance and academic publication.
• Proven Reliability in High-Impact Research: This platform is trusted by leading institutions for research published in top-tier journals like Nature Photonics, proving its capability in cutting-edge material science.

Contact our technical sales team today to request a formal quotation or to discuss a customized configuration tailored to your specific thin-film research requirements.