1200C Max 6 Channel High Cleanliness Hydrogen Furnace for High Throughput Annealing

Atmosphere Furnace

1200C Max 6 Channel High Cleanliness Hydrogen Furnace for High Throughput Annealing

Item Number: TU-QF25

Maximum Temperature: 1200℃ Processing Channels: 6 Independent Channels Cleanliness Standard: US FED STD 209E Class 100
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Product Overview

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This high-performance multi-channel thermal processing system is engineered for advanced material science and industrial R&D applications requiring extreme purity and high-throughput capabilities. By integrating six independent heating channels within a specialized high-cleanliness chamber, the equipment allows researchers and engineers to perform multiple simultaneous heat treatment cycles under varying parameters. This configuration significantly accelerates experimental workflows while maintaining a controlled environment suitable for the most sensitive materials, including semiconductors, advanced alloys, and high-purity ceramics.

Designed specifically for operation in cleanroom environments, the system achieves a cleanliness level compliant with US FED STD 209E Class 100. The internal architecture utilizes premium insulation and surface treatments to prevent particulate contamination, making it the ideal solution for semiconductor wafer annealing, thin-film deposition research, and high-purity sintering. This unit excels in atmosphere-controlled processes, offering robust compatibility with hydrogen, vacuum, and inert gas environments, ensuring versatile performance for complex metallurgical and chemical synthesis procedures.

Built for long-term reliability in demanding industrial and academic settings, the equipment features a heavy-duty stainless steel chamber and advanced safety protocols. The inclusion of specialized hydrogen safety mechanisms and precise automation allows for continuous, unattended operation with total confidence. Whether deployed in university laboratories or corporate pilot lines, this system represents a premium investment in thermal processing precision, delivering consistent, reproducible results across every channel.

Key Features

  • Six Independent Heating Channels: Each channel is equipped with its own dedicated temperature control system and gas delivery infrastructure, allowing for the simultaneous processing of six distinct samples at different temperatures and atmospheric conditions.
  • Class 100 Cleanliness Certification: The high-purity alumina fiber chamber features an specialized alumina-coated surface designed to minimize dust generation and outgassing, ensuring an internal environment that meets US FED STD 209E Class 100 standards.
  • Advanced Hydrogen Safety System: To prevent potential explosions, the equipment utilizes an inert gas circulation system within the insulation layer between the tube and the chamber. In the event of a tube failure, hydrogen is safely contained and diluted within this protective interlayer.
  • Precision PID and PC Integration: Each heating module is managed by an intelligent 50-segment programmable controller, fully integrated with PC-based software for real-time monitoring, data logging, and complete automated control of heating, dwelling, and cooling cycles.
  • High-Purity Alumina Fiber Chamber: The chamber is constructed from vacuum-formed ceramic fiber to provide superior thermal insulation and high heating efficiency while significantly extending the operational life of the internal components.
  • Dual-Layer Air-Cooled Shell: The outer structure employs a dual-layer design with integrated forced-air cooling, ensuring that the external surfaces remain safe to touch even during sustained operation at maximum internal temperatures.
  • Automated Gas and Pressure Management: The software-controlled constant pressure sintering mode automatically adjusts gas flow rates to maintain a stable, slightly positive pressure, ensuring consistent atmospheric density throughout the heat treatment process.
  • Independent Water-Cooled Flanges: Six sets of 304 stainless steel flanges with integrated water-cooling ports protect the O-ring seals, ensuring long-term vacuum integrity and high-pressure stability during intensive high-temperature cycles.
  • Customizable Tube Options: While high-purity quartz tubes are standard, the system supports nickel-based alloy or zirconium alloy tubes to accommodate specialized corrosive environments or specific temperature requirements up to 1200°C.
  • Comprehensive Data Documentation: All experimental process data, including temperature curves, pressure levels, and vacuum status, are recorded and can be exported for thorough analysis and quality control verification.

Applications

Application Description Key Benefit
Semiconductor Annealing High-purity heat treatment of silicon and compound semiconductor wafers in cleanroom conditions. Minimizes particulate contamination and ensures uniform crystal recovery.
Hydrogen Reduction Reduction of metal oxides to pure metal powders or thin films using a controlled hydrogen atmosphere. High-throughput processing with integrated explosive gas safety protocols.
Advanced Metallurgy Sintering and heat treatment of high-temperature alloys and non-ferrous metals across distinct stages. Independent channels allow for rapid comparative material studies.
Thin Film R&D Thermal processing of functional thin films on ceramic or glass substrates in vacuum or inert gas. Prevents oxidation and ensures precise control over film microstructure.
Nuclear Material Testing High-temperature analysis of specialized materials under simulated operational atmospheres. Robust containment and reliable data logging for sensitive research.
Ceramic Sintering Sintering of advanced technical ceramics, including dental materials and structural components. Exceptional temperature uniformity across all six sample zones.
Industrial QC Testing Batch testing of material samples to verify thermal stability and chemical resistance across production lots. Increases lab productivity by running multiple test profiles simultaneously.

Technical Specifications

Category Parameter Specification (TU-QF25)
Model Identification Product Item Number TU-QF25
Power Supply Input Power AC three-phase 380V; 50/60Hz
Maximum Power 48 KW
Temperature Performance Max. Operating Temperature 1200℃ (≤ 30 min)
Continuous Temperature 1100℃
Heating Rate ≤ 10℃/min
Heating Zone Length 700 mm
Temperature Accuracy ± 1℃ (Optional European controllers ± 0.1℃)
Control System Controller Model 858P PID Intelligent Controller
Programming 50-segment programmable control
Control Interface DB9 PC Communication Port with specialized software
Control Modes Automatic purging mode; Constant pressure sintering mode
Construction Chamber Material High-purity alumina fiber with surface coating
Heating Elements Molybdenum iron chromium aluminum
Thermocouple Type K
Cleanliness Level US FED STD 209E Class 100
Gas & Vacuum Flange Type 304 Stainless Steel Water-Cooled Flanges (KF60/KF25)
Gas Flow Control 6 Independent Float Flowmeters (40-400ml/min)
Standard Mechanical Relief Opens at 0.04 MPa
Sintering Pressure Range 100,000 Pa - 115,000 Pa (Automatic Regulation)
Tube Specifications Standard Quartz Sizes Φ25x19 ID, Φ50x44 ID, Φ60x55 ID (Length: 1200 mm)
Optional Alloy Tubes Nickel-based alloy (1200℃) / Zirconium alloy (800℃)
Optional Accessories Combustible Gas Treatment 200W, AC220V, with current transformer protection
Hydrogen Detection Fixed or Portable (1-1000ppm range)
Vacuum Pumps Mechanical (10^-2 Torr) or Molecular (10^-5 Torr)
Chiller Unit CW-6300 (Cooling capacity 26826 Btu/h)

Why Choose 1200C Max 6 Channel High Cleanliness Hydrogen Furnace for High Throughput Annealing

  • Unmatched Throughput and Versatility: This system effectively does the work of six separate furnaces, allowing for massive scaling of R&D efforts without increasing the equipment footprint or energy overhead.
  • Superior Cleanroom Compatibility: Engineered for high-purity environments, the system ensures that samples remain free from contaminants, a critical requirement for modern semiconductor and nanotechnology research.
  • Safety-First Engineering: With integrated inert gas interlayers and optional combustible gas treatment devices, this equipment sets the industry standard for safe hydrogen atmosphere thermal processing.
  • Precision Automation and Data Integrity: The advanced software interface not only automates complex gas-purging and sintering routines but also ensures every data point is captured for regulatory compliance and scientific validation.
  • Customizable and Future-Proof: From various tube materials to advanced molecular pump integration, the system can be tailored to meet your current research needs and upgraded as your processing requirements evolve.

Contact THERMUNITS today to request a technical consultation or a formal quote for your customized high-throughput thermal processing solution.

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