Dual Zone Quartz Tube Furnace with 80mm Diameter 1200C Max Temperature 3 Channel Gas Mixer and Vacuum Pump System

Product Overview

This high-performance dual-zone split tube furnace represents a versatile solution for advanced material science research and industrial R&D. By integrating a multi-channel gas delivery system with high-vacuum capabilities, this system provides a controlled environment necessary for Chemical Vapor Deposition (CVD), Chemical Vapor Transport (CVT), and various high-temperature annealing processes. The equipment is designed for researchers who require absolute control over thermal gradients and atmospheric composition, ensuring repeatable results in the development of next-generation materials like transition metal dichalcogenides and thin-film semiconductors.

The core value of this unit lies in its dual-zone architecture, which allows for the creation of precise temperature gradients across a high-purity quartz tube. This functionality is essential for processes where precursor sublimation and substrate deposition must occur at distinct, independently controlled temperatures. Target industries include semiconductor manufacturing, nanotechnology research, and advanced metallurgy. The split-furnace design facilitates rapid cooling and easy access to the process chamber, significantly reducing downtime between experimental runs and increasing the throughput of busy laboratory environments.

Reliability is engineered into every component of this thermal processing system. From the double-layer steel casing with integrated fan cooling to the precision PID controllers, the equipment is built to withstand continuous operation under demanding conditions. The inclusion of an anti-corrosive vacuum gauge ensures that even when working with aggressive gases, the system maintains accurate pressure monitoring without sensor degradation. This unit offers the robust performance and safety compliance required for modern laboratory settings, providing users with the confidence to execute complex thermal profiles with minimal supervision.

Key Features

• Independent Dual-Zone Heating: The furnace features two separate heating zones, each 200 mm in length, providing a total 400 mm heating area. This allows for the creation of precise temperature gradients or a large constant temperature zone of up to 250 mm when both zones are synced, offering unparalleled flexibility for Chemical Vapor Transport (CVT).
• Precision PID Temperature Control: Equipped with two advanced PID controllers, the system offers 30 programmable segments for meticulous management of heating rates, cooling rates, and dwell times. Accuracy is maintained within ±1°C, ensuring high process stability for sensitive material growth.
• Integrated 3-Channel Gas Mixing Station: A professional gas delivery system is included, featuring three independent flow meters and a mixing tank. This allows for the precise blending of various process gases, enabling complex CVD reactions and atmospheric control within the quartz reaction chamber.
• High-Performance Vacuum Integration: The system includes a heavy-duty 156 L/m double-stage rotary vane vacuum pump, capable of achieving vacuum levels down to 10^-2 torr. The vacuum system is secured with high-quality KF25 stainless steel flanges and valves to ensure long-term vacuum integrity and leak rates below 5 m-torr/min.
• Anti-Corrosive Pirani Capacitance Gauge: Unlike standard gauges, this unit utilizes a ceramic-coated capacitance diaphragm gauge. This specialized sensor is designed to resist corrosion from aggressive chemical precursors, providing reliable vacuum measurements from 10^-5 to 1000 torr in harsh process environments.
• Advanced Safety and Cooling: The double-layer steel casing incorporates an automatic air-cooling system. Built-in thermostats activate internal fans if the case temperature exceeds 55°C, ensuring the exterior remains safe to touch while protecting internal electronic components from heat stress.
• High-Purity Quartz Process Chamber: The system utilizes an 80mm OD high-purity fused quartz tube. This material offers exceptional thermal shock resistance and chemical inertness, providing a transparent environment that allows for visual monitoring of samples and precursors during heat treatment.
• Automation and Connectivity: A built-in RS485 communication port allows for external data logging. The system is also compatible with LabView-based software, enabling remote operation and recipe management via a PC for highly automated research workflows.

Applications

Technical Specifications

Why Choose Us

• Superior Thermal Versatility: The dual-zone configuration of this system provides researchers with the essential capability to create precise thermal gradients, a requirement for Chemical Vapor Transport and high-quality crystal growth that single-zone furnaces cannot match.
• Industrial-Grade Vacuum Reliability: By including an anti-corrosive capacitance diaphragm gauge as standard, this furnace ensures longevity and accuracy when handling aggressive gases, protecting your investment from the sensor failures common in lower-tier systems.
• Precision Atmosphere Engineering: The integrated 3-channel gas mixer and vacuum pump provide a complete, turn-key solution for CVD research, eliminating the need for third-party components and ensuring perfect compatibility between gas delivery and thermal processing.
• Proven Safety and Certification: With CE certification and the use of UL/MET/CSA certified electrical components, this equipment meets the rigorous safety standards required by leading academic and industrial laboratories worldwide.
• Robust Engineering and Support: Constructed with a double-layered air-cooled shell and high-efficiency Mo-doped alloy elements, the unit is designed for years of consistent operation. We provide comprehensive technical support and customization options to meet your specific research needs.

Contact our technical sales team today for a detailed quote or to discuss a custom thermal processing solution tailored to your laboratory's requirements.