Double Temperature Zone Double Cover Tube Furnace for High Temperature CVD and Vacuum Annealing

Tube Furnace

Double Temperature Zone Double Cover Tube Furnace for High Temperature CVD and Vacuum Annealing

Item Number: TU-GS08

Maximum Temperature: 1200°C Heating Element: Swedish Kanthal A1 Resistance Wire Temperature Control Accuracy: ±1°C
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Product Overview

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This high-performance double temperature zone tube furnace is engineered to meet the rigorous demands of material science research and industrial production. By combining two independent heating zones within a single, streamlined unit, this system provides researchers with the flexibility to create complex thermal gradients or maintain highly stable temperature profiles over an extended heating length. The dual-cover design enhances accessibility while optimizing thermal management, making the equipment an essential tool for sophisticated heat treatments where precision and consistency are paramount.

Designed for versatility, the equipment excels in high-temperature sintering, reducing atmosphere processes, and chemical vapor deposition (CVD). It is widely utilized across aerospace, semiconductor, and advanced ceramics industries to perform vacuum annealing and controlled atmosphere tests. The robust construction and integrated safety features ensure that the unit operates reliably under continuous-duty conditions, providing laboratory personnel with the confidence to conduct long-duration experiments without oversight.

Built with a focus on durability and performance, this system incorporates premium heating elements and advanced insulation materials. The integration of high-grade resistance wires and vacuum-formed alumina fiber ensures rapid heating rates and exceptional energy efficiency. Whether for basic research in universities or high-stakes material development in industrial labs, this equipment delivers the thermal stability and atmospheric control required for the most sensitive technical processes.

Key Features

  • Premium Swedish Kanthal A1 Heating Elements: The unit utilizes imported Kanthal A1 resistance wire, capable of reaching surface temperatures up to 1420°C. These elements are chosen for their balanced resistance and slag-free operation, ensuring a clean thermal environment and a service life that significantly outlasts standard alloy wires.
  • Advanced Dual-Zone Control: Featuring two independent temperature zones, the system allows for the creation of precise thermal gradients. This is critical for processes like physical vapor transport or complex CVD applications where precursor vaporization and substrate deposition require distinct, simultaneous temperatures.
  • High-Purity Alumina Fiber Chamber: The furnace chamber is constructed using high-quality polycrystalline alumina fiber, formed through vacuum suction and filter molding based on advanced Japanese technology. This results in a low thermal mass, high insulation efficiency, and superior resistance to thermal shock.
  • Sophisticated PID Temperature Regulation: Equipped with a 30-segment intelligent PID controller, the system maintains a control precision of ±1°C. It features over-temperature protection, thermocouple failure alerts, and a power-off recovery function that resumes the program from the point of interruption.
  • Double-Shell Forced Air Cooling: To ensure operator safety and structural longevity, the furnace features a double-shell construction. An integrated cooling fan circulates air between the inner and outer layers, maintaining an external surface temperature of less than 45°C even during maximum temperature operation.
  • Comprehensive Safety Interlocks: The unit includes an automatic open-cover protection system. If the furnace lid is opened during operation, a relay immediately disconnects the main power supply to protect the user from electrical hazards and high-temperature exposure.
  • Digital Communication and Monitoring: Standard RS485 interfaces allow the equipment to connect directly to a computer. Users can control parameters, view real-time PV (Process Value) and SV (Set Value) curves, and log temperature data for historical analysis and quality assurance reporting.
  • Vacuum and Atmosphere Versatility: The equipment is designed to interface with various gas supply and vacuum systems. From simple inert gas purging to high-vacuum environments reaching 10-3 Pa, the system accommodates diverse atmospheric requirements for sensitive material processing.

Applications

Application Description Key Benefit
CVD / PECVD Growing thin films and nanostructures through chemical vapor deposition at controlled temperatures. Precise gradient control for consistent film thickness and quality.
Vacuum Annealing Relieving internal stresses in metal alloys and semiconductor wafers under high vacuum. Prevents oxidation and ensures high-purity material properties.
Atmosphere Sintering Sintering advanced ceramics and powder metallurgy parts in reducing or inert atmospheres. Superior thermal uniformity leads to consistent product density.
Battery Material R&D Thermal processing of anode and cathode materials for next-generation energy storage. Reliable cycling and data logging for repeatable experimental results.
Calcination Heating ores or chemical compounds to effect thermal decomposition. Energy-efficient operation with rapid heating and cooling cycles.
Reducing Atmosphere Tests Processing materials in hydrogen or carbon monoxide environments to study oxidation states. Gas-tight tube seals and integrated flow control ensure safe operation.

Technical Specifications

Parameter TU-GS08-I TU-GS08-II TU-GS08-III TU-GS08-IV
Tube Outer Diameter (mm) Dia 60 Dia 80 Dia 100 Dia 120
Tube Length (mm) 1460 1460 1460 1460
Power Consumption 2.5 KW 2.5 KW 4.0 KW 4.0 KW
Boundary Dimensions (mm) 1500x490x600 1500x490x600 1500x490x600 1500x490x600
Supply Voltage 220V 220V 220V 220V
Heating Element Swedish Kanthal A1 Swedish Kanthal A1 Swedish Kanthal A1 Swedish Kanthal A1
Max. Temperature 1200°C 1200°C 1200°C 1200°C
Rated Temperature 1100°C 1100°C 1100°C 1100°C
Heating Zone Length 205mm + 205mm 205mm + 205mm 205mm + 205mm 205mm + 205mm
Constant Temp Length 80mm + 80mm 80mm + 80mm 80mm + 80mm 80mm + 80mm
Heating Rate ≤100°C / min ≤100°C / min ≤100°C / min ≤100°C / min
Control Accuracy ±1°C ±1°C ±1°C ±1°C
Thermocouple Type K Type K Type K Type K Type
Vacuum Capability Optional (10Pa to 10-3 Pa) Optional (10Pa to 10-3 Pa) Optional (10Pa to 10-3 Pa) Optional (10Pa to 10-3 Pa)
Electrical Components Chint / Semikron Chint / Semikron Chint / Semikron Chint / Semikron

Why Choose This Furnace

  • Unmatched Thermal Engineering: By utilizing Swedish Kanthal A1 wire and Japanese-inspired chamber geometry, this system offers thermal stability that is significantly superior to standard laboratory furnaces. The balanced resistance ensures a uniform temperature field, which is critical for high-fidelity research.
  • Proven Long-Term Reliability: The choice of high-quality components, such as Semikron thyristors and vacuum-suctioned alumina fiber, ensures that the unit can withstand the stresses of high-temperature operation over many years of service.
  • Versatile Expansion Options: This equipment can be customized with various vacuum systems (from single-stage pumps to high-vacuum molecular units) and gas supply systems (mass flow meters, bubblers, or evaporators) to meet specific process requirements.
  • Enhanced Operator Safety: With integrated leakage protectors, open-cover power cut-offs, and double-shell cooling, this system meets the highest safety standards required for modern industrial and academic laboratories.
  • Data-Driven Control: The ability to monitor and control the furnace via computer, combined with detailed curve drawing and data storage, provides the documentation necessary for strictly controlled R&D and quality audit environments.

This system represents a premium investment in thermal processing technology, combining precision, safety, and durability to support your most critical research and production goals. Contact us today for a technical consultation or a customized quote for your specific laboratory requirements.

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