High Temperature Dual Zone Split Tube Furnace for Advanced Atmosphere Sintering and Vacuum CVD Applications

Tube Furnace

High Temperature Dual Zone Split Tube Furnace for Advanced Atmosphere Sintering and Vacuum CVD Applications

Item Number: TU-GS15

Maximum Temperature: 1400°C Heating Zones: Dual Zone (Independent Control) Temperature Accuracy: ±1°C
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Product Overview

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This high-performance thermal system represents a benchmark in laboratory heat treatment technology, specifically engineered for advanced material research and industrial R&D. By utilizing a dual-zone heating configuration within a split-hinge architecture, the equipment allows for precise temperature profiling and rapid cooling, making it an indispensable asset for high-temperature atmosphere sintering, CVD experiments, and vacuum annealing. The core value proposition lies in its ability to maintain a exceptionally uniform temperature field while offering the flexibility of independent control over separate heating zones.

Designed for demanding laboratory environments, the system is frequently deployed in material science institutes, aerospace research facilities, and semiconductor development labs. Whether performing complex chemical vapor deposition or simple atmosphere reduction, this equipment ensures high-reproducibility and precision. The double-walled housing construction facilitates efficient air cooling, ensuring that while the internal chamber reaches extreme temperatures, the exterior surface remains safe to the touch, reflecting a commitment to both performance and operator safety.

Engineers and procurement teams can rely on this unit for its robust construction and high-grade thermal components. From the imported Japanese polycrystalline alumina fiber insulation to the silicon carbide (SiC) heating elements, every detail is optimized for longevity and energy efficiency. This system provides a stable, controllable environment for synthesizing new materials or conducting rigorous thermal stress tests, ensuring that your research outcomes are consistent even under the most demanding experimental conditions.

Key Features

  • Dual-Zone Independent Control: This system features two distinct heating zones, each equipped with its own dedicated controller and thermocouple, allowing users to create specific thermal gradients or maintain a long, uniform constant-temperature region.
  • Precision PID Temperature Management: Utilizing an advanced 40-segment digital controller, the equipment offers professional-grade accuracy with 6 PID parameters specifically tuned for low, middle, and high-temperature ranges to prevent overshoot.
  • Superior Thermal Insulation: The chamber is constructed from high-purity polycrystalline alumina fiber, which provides excellent heat preservation, high reflectivity, and resistance to thermal expansion and contraction, significantly reducing energy consumption.
  • High-Performance SiC Heating Elements: Silicon carbide elements are strategically positioned to ensure a uniform temperature field and a long operational lifespan, even when subjected to frequent high-temperature cycling.
  • Integrated Safety Protection Systems: The unit is equipped with an overtravel-limit switch that automatically cuts power when the cover is opened, alongside over-temperature and over-current protection for fail-safe operation.
  • Vacuum and Atmosphere Versatility: Featuring stainless steel double-ring sealing flanges, the furnace can achieve vacuum levels down to 10-4 Pa when paired with a molecular pump, and supports various gas flow configurations for controlled atmosphere processing.
  • Split-Chamber Design with Hydraulic Support: The split furnace body can be easily opened using a hydraulic lifter, allowing for rapid cooling of the tube or convenient access for sample placement and maintenance.
  • Advanced Data Communication: An integrated 485 communication interface allows the equipment to be connected to a computer for real-time monitoring, data logging, and the generation of heating curves through dedicated software.
  • Reliable Power Electronics: Built with premium components including German-engineered silicon-controlled rectifiers and phase-shift triggers, the system ensures stable current delivery and protects the heating elements from electrical surges.

Applications

Application Description Key Benefit
Chemical Vapor Deposition (CVD) Growth of thin films and nanomaterials by reacting gaseous precursors within the heated tube. Precise zone control ensures uniform film thickness.
Pyrolysis Research Thermal decomposition of organic materials like waste tires or biomass in an inert atmosphere. Dual zones prevent localized carbonization and optimize oil/gas yield.
Atmosphere Sintering Sintering of ceramic or metallic powders under reducing or inert gases to prevent oxidation. Reliable flange sealing maintains high atmosphere purity.
Vacuum Annealing Stress-relieving of metal components or wafers in a low-pressure environment. High vacuum capability prevents surface contamination.
Catalyst Testing Evaluating the efficiency of catalytic materials under specific temperature gradients. Independent zones allow for varied reaction stages in one pass.
Ceramic Co-firing Simultaneous firing of multi-layer ceramic components requiring complex ramp/soak cycles. 40-segment programming allows for intricate thermal profiles.
Semiconductor Doping Diffusion of dopants into semiconductor wafers at high temperatures. Excellent temperature uniformity within the process tube.

Technical Specifications

Parameter TU-GS15-I TU-GS15-II TU-GS15-III
Tube Outer Diameter 60 mm 80 mm 100 mm
Tube Length 1000 mm 1000 mm 1000 mm
Max. Operating Temp 1400°C 1400°C 1400°C
Continuous Working Temp 1350°C 1350°C 1350°C
Heating Zones 2 Zones (260mm each) 2 Zones (260mm each) 2 Zones (260mm each)
Constant Temp. Length 100mm per zone 100mm per zone 100mm per zone
Heating Rate ≤30°C / min ≤30°C / min ≤30°C / min
Temperature Accuracy +/- 1°C +/- 1°C +/- 1°C
Thermocouple Type Type S Type S Type S
Heating Element Silicon Carbide (SiC) Silicon Carbide (SiC) Silicon Carbide (SiC)
Temperature Controller Shimaden FP93 (40 Segments) Shimaden FP93 (40 Segments) Shimaden FP93 (40 Segments)
Tube Material Alumina Ceramic Alumina Ceramic Alumina Ceramic
Chamber Material Polycrystalline 98% Alumina Fiber Polycrystalline 98% Alumina Fiber Polycrystalline 98% Alumina Fiber
Trigger Phase-shift trigger Phase-shift trigger Phase-shift trigger
Overall Dimensions 1420 x 490 x 855 mm 1420 x 490 x 855 mm 1420 x 490 x 855 mm
Vacuum Level 10-1 to 10-4 Pa (based on pump) 10-1 to 10-4 Pa (based on pump) 10-1 to 10-4 Pa (based on pump)

Why Choose This Furnace

  • Unmatched Thermal Precision: The dual-zone configuration combined with Japanese-imported PID controllers provides world-class stability and accuracy for sensitive material syntheses.
  • Industrial-Grade Durability: Built with SiC elements and high-density alumina fiber, this unit is designed for continuous operation in high-throughput industrial and academic labs.
  • Advanced Safety Protocol: From mechanical limit switches to electronic leakage protection, the equipment is engineered to protect users and your facility from operational hazards.
  • Customizable Atmosphere Control: The inclusion of high-vacuum flanges and optional digital flow meters allows for a highly tailored environment, whether working with hydrogen, argon, or vacuum.
  • Expert Engineering Support: We provide comprehensive documentation, control software, and technical assistance to ensure this investment integrates seamlessly into your workflow.

Contact our technical sales team today for a formal quotation or to discuss a custom thermal processing solution for your laboratory.

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