Tube Furnace
High Temperature 1700C Dual Zone Tube Furnace for Material Science and Industrial Chemical Vapor Deposition Research
Item Number: TU-74
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Product Overview

This high-performance thermal processing system is engineered for advanced material research and industrial development requiring precise, independent control over multiple thermal zones. By utilizing a dual-zone configuration, the equipment allows for the creation of sophisticated temperature gradients, which are essential for specialized processes such as Chemical Vapor Transport (CVT) and Physical Vapor Deposition (PVD). The system's architecture combines two distinct heating technologies within a single unit, providing a versatile platform for synthesizing functional materials and growing high-quality epitaxial films.
Designed for the most demanding laboratory and industrial environments, this unit is utilized extensively in semiconductor research, metallurgy, and solid-state chemistry. It serves as a critical tool for researchers focused on the growth of transition metal dichalcogenide (TMD) nanoribbons and the development of high-purity single crystals. The robust construction ensures that the system maintains exceptional thermal stability even when operating at temperatures reaching 1700ºC, enabling consistent and repeatable results in high-stakes R&D projects.
Reliability and safety are at the core of this equipment's design philosophy. Built with a double-layer steel case and integrated cooling fans, the system maintains a low exterior surface temperature, protecting laboratory personnel and surrounding equipment. The use of high-purity fibrous alumina insulation not only enhances energy efficiency but also contributes to rapid heating and cooling cycles, maximizing throughput in busy research facilities. Buyers can invest with confidence, knowing this system is built to withstand the rigors of continuous high-temperature operation without compromising performance.
Key Features
- Independent Dual-Zone Control: Each 12-inch heating zone is managed by its own precision digital controller, allowing for the generation of specific thermal gradients or uniform heating across a 24-inch total span.
- Advanced Dual-Element Technology: The first zone utilizes Silicon Carbide (SiC) elements for stable operation up to 1400ºC, while the second zone employs Molybdenum Disilicide (MoSi2) elements to reach peak temperatures of 1700ºC, offering unmatched flexibility for diverse thermal profiles.
- Precision PID Temperature Management: Equipped with dual 30-segment programmable digital controllers, the system provides automated PID control via Silicon Controlled Rectifiers (SCR), ensuring accuracy within ±1ºC.
- High-Purity Alumina Insulation: The furnace chamber is lined with high-density fibrous alumina, which minimizes heat loss and ensures a high degree of temperature uniformity while preventing contamination of sensitive samples.
- Enhanced Safety Protocols: Integrated over-temperature alarms and automatic protection circuits allow for safe, unattended operation, while the double-layer casing keeps the external environment cool.
- Vacuum-Ready Sealing System: The equipment includes heavy-duty stainless steel vacuum sealing flanges with built-in valves and pressure meters, supporting low-pressure applications and inert atmosphere processing.
- High-Strength Alumina Process Tubes: The system supports various tube diameters (50mm, 60mm, and 80mm) to accommodate different sample volumes and throughput requirements without sacrificing structural integrity at high temperatures.
- Robust Power Architecture: Utilizing heavy-duty UL-approved power cables and a 60A air breaker requirement, the system is designed for stable power delivery during high-demand heating phases.
- Versatile Interface Options: The standard barbed hose fittings can be upgraded to KF25 adapters for high-vacuum applications or VCR face seal fittings for high-pressure gas delivery, catering to specific technical needs.
Applications
| Application | Description | Key Benefit |
|---|---|---|
| TMD Nanoribbon Growth | Precise control of chalcogen vapor pressure during the growth of Transition Metal Dichalcogenide nanoribbons. | Independent adjustment of vapor concentration without affecting growth kinetics. |
| Chemical Vapor Transport (CVT) | Establishing stable temperature gradients across the process tube for the migration of chemical vapors. | Enables the growth of large, high-purity single crystals like PdCoO2. |
| Epitaxial Film Growth | Utilizing CVD or PVD processes under vacuum to deposit thin layers on substrates. | High temperature uniformity across the growth zone ensures consistent film thickness. |
| Catalytic Pyrolysis | Heating industrial waste materials like scrap tires at controlled rates to analyze byproduct distribution. | Prevents localized overheating and ensures high-quality oil and gas recovery. |
| Functional Material Synthesis | Subjecting material precursors to specific thermal gradients to induce desired phase changes. | Repeatable production of advanced materials with tailored physical properties. |
| Semiconductor Doping | Diffusion of dopants into semiconductor wafers under high-temperature atmosphere control. | Precise 30-segment programming allows for exact penetration depth control. |
| Ceramic Sintering | High-temperature consolidation of advanced ceramic powders into solid components. | Rapid heating rates up to 10ºC/min optimize processing time for high-density ceramics. |
Technical Specifications
| Parameter | TU-74-50 | TU-74-60 | TU-74-80 |
|---|---|---|---|
| Tube Outer Diameter | 50 mm | 60 mm | 80 mm |
| Tube Inner Diameter | 44 mm | 54 mm | 74 mm |
| Tube Length | 1200 mm | 1200 mm | 1200 mm |
| Zone 1 Max Temperature | 1500ºC (SiC Elements) | 1500ºC (SiC Elements) | 1500ºC (SiC Elements) |
| Zone 2 Max Temperature | 1700ºC (MoSi2 Elements) | 1700ºC (MoSi2 Elements) | 1700ºC (MoSi2 Elements) |
| Heating Zone Length | 12" + 12" (300mm + 300mm) | 12" + 12" (300mm + 300mm) | 12" + 12" (300mm + 300mm) |
| Constant Temp Zone | 14" (350mm) within ±1ºC | 14" (350mm) within ±1ºC | 14" (350mm) within ±1ºC |
| Heating Rate | Max. 10ºC/min | Max. 10ºC/min | Max. 10ºC/min |
| Thermocouples | S-type (Zone 1) / B-type (Zone 2) | S-type (Zone 1) / B-type (Zone 2) | S-type (Zone 1) / B-type (Zone 2) |
| Control Accuracy | ±1ºC | ±1ºC | ±1ºC |
| Total Power | 9 KW | 9 KW | 9 KW |
| Voltage | 220-240V Single Phase | 220-240V Single Phase | 220-240V Single Phase |
| Overall Dimensions | 780 x 450 x 720 mm | 780 x 450 x 720 mm | 780 x 450 x 720 mm |
| Compliance | CE Certified | CE Certified | CE Certified |
| Vacuum Limit | < 0.02 Mpa (Safe to 1500ºC) | < 0.02 Mpa (Safe to 1500ºC) | < 0.02 Mpa (Safe to 1500ºC) |
Why Choose High Temperature 1700C Dual Zone Tube Furnace
- Superior Engineering and Material Quality: Featuring a combination of SiC and MoSi2 heating elements, this system is designed for longevity and precise performance that commodity furnaces cannot match.
- Industry-Leading Thermal Gradient Control: The independent 30-segment PID control for each zone allows researchers to execute complex thermal profiles with unmatched repeatability and accuracy.
- Comprehensive Safety and Compliance: With CE certification and built-in over-temperature protection, this unit meets the stringent safety requirements of modern industrial and academic laboratories.
- Flexible and Scalable Configuration: From adjustable tube sizes to optional wireless remote control and Labview integration, this system can be customized to meet the specific throughput and data recording needs of your facility.
- Proven Reliability in Advanced R&D: This equipment is a staple in high-end material synthesis, trusted by leading institutions for its ability to maintain stable vacuum and temperature environments.
Contact our technical sales team today for a custom quote or to discuss how our thermal processing solutions can be tailored to your specific research requirements.
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