RTP Furnace
1200C Dual Temperature Zone Slidable Tube Furnace for 2D Material Growth and TCVD Synthesis
Item Number: TU-RT10
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Product Overview
This high-performance dual-furnace system is engineered specifically for the synthesis of advanced 2D materials and complex thin-film deposition. By integrating two independent furnace units onto a single 80mm processing tube, the equipment allows for the creation of precise temperature gradients and distinct thermal environments for sublimation and deposition. One furnace is designed as a stationary unit while the other features a high-speed sliding mechanism, enabling researchers and industrial engineers to transition samples between high-temperature zones and ambient conditions with exceptional speed and repeatability.
The system is ideally suited for Thermal Chemical Vapor Deposition (TCVD) processes, particularly in the production of 2D Transition Metal Dichalcogenide (TMDC) monolayers and advanced perovskite microcrystals. By separating the precursor evaporation zone from the growth zone, this equipment provides unparalleled control over vapor pressure and stoichiometric ratios. The versatility of the dual-zone configuration makes it an essential tool for material science laboratories and high-tech R&D facilities focusing on graphene, carbon nanotubes, and semiconductor thin films.
Designed for demanding industrial use, the equipment prioritizes structural integrity and thermal stability. The combination of high-purity fused quartz, precision-engineered heating elements, and a robust linear sliding rail system ensures that every cycle is consistent and reliable. This unit offers the durability required for continuous operation under vacuum or controlled atmosphere conditions, giving procurement teams and research leads complete confidence in their long-term capital investment.
Key Features
- Independent Dual-Zone Control: This system utilizes two separate heating units, each equipped with its own dedicated PID temperature controller, allowing for distinct sublimation and deposition temperatures without thermal interference.
- Rapid Thermal Processing via Sliding Mechanism: The right-side furnace is mounted on a double linear sliding rail system, allowing it to move away from the growth zone to achieve ultra-fast cooling rates of approximately 100°C/min, crucial for quenching phases and preserving material morphology.
- Precision Linear Motion: The sliding furnace is driven by a 200W electric motor with manual speed and direction controls, supported by chrome-plated steel rails for smooth, vibration-free movement during critical growth stages.
- Advanced Multi-Zone Stationary Furnace: The left-side stationary unit features a three-zone configuration (152.4mm each), providing an extended constant temperature zone and allowing for fine-tuning of the thermal profile across the precursor source.
- High-Purity Quartz Processing Environment: The 80mm diameter fused quartz tube provides a clean, chemically inert environment for sensitive reactions, supporting flow rates up to 1000 sccm and pressures up to 0.4 bar.
- Sophisticated Thermal Regulation: Equipped with FA-YD518P-AG controllers, the system offers 30 programmable segments for ramping, dwelling, and cooling, with built-in auto-tune functions to maintain ±1°C accuracy.
- Durable Heating Technology: High-quality Fe-Cr-Al alloy heating elements, doped with Molybdenum, provide a maximum working temperature of 1200°C and excellent oxidation resistance for extended service life.
- Vacuum Integration Capabilities: Stainless steel vacuum flanges with integrated gauges are standard, allowing the system to achieve vacuum levels as low as 10E-5 torr when paired with a molecular pump.
- Comprehensive Safety Monitoring: The system includes built-in over-temperature and thermocouple failure alarms, ensuring the safety of the equipment and the operator during high-temperature cycles.
Applications
| Application | Description | Key Benefit |
|---|---|---|
| TMDC Monolayer Growth | Synthesis of MoS2, WS2, and other Transition Metal Dichalcogenides. | Precise control of sublimation vs. deposition temperatures for high-quality monolayers. |
| Perovskite Synthesis | Vapor deposition of CsPbBr3 and other halide perovskites. | Independent zone control maintains ideal stoichiometric ratios through vapor pressure management. |
| Graphene Fabrication | High-temperature TCVD on metallic catalysts using carbon precursors. | Slidable furnace enables rapid quenching to control grain size and layers. |
| Carbon Nanotube (CNT) CVD | Catalyst-mediated growth of single-walled or multi-walled nanotubes. | High-flow gas delivery and consistent temperature zones ensure uniform alignment. |
| Vapor Phase Epitaxy | Controlled growth of thin films on crystalline substrates. | Minimal thermal interference between precursors and growth substrate. |
| Semiconductor Doping | Diffusion of dopants into semiconductor wafers under controlled atmospheres. | Precision PID control ensures repeatable doping profiles across multiple batches. |
| Nanowire Synthesis | Vapor-Liquid-Solid (VLS) growth of semiconductor and oxide nanowires. | Fast cooling prevents unwanted secondary growth or phase transformations. |
Technical Specifications
| Category | Specification | Parameter Value (TU-RT10) |
|---|---|---|
| Model Reference | TU-RT10 System | Dual Furnace Slidable Configuration |
| Sliding Furnace (Right) | Furnace Model | Single-zone OTF-1200X |
| Sliding Distance | 300 mm | |
| Total Heating Zone | 440 mm | |
| Constant Temp Zone | 150 mm (±1 °C) | |
| Max Temperature | 1200 °C (<1 hour); 1100 °C (Continuous) | |
| Stationary Furnace (Left) | Furnace Model | Three-zone OTF-1200X-III-C |
| Heating Zone Lengths | 152.4mm + 152.4mm + 152.4mm (Total 450mm) | |
| Constant Temp Zone | 200 mm (±1 °C) | |
| Max Temperature | 1200 °C (<1 hour); 1100 °C (Continuous) | |
| Processing Tube | Material | High purity fused quartz |
| Dimensions | 80mm O.D x 72mm I.D x 1800mm Length | |
| Max Pressure | 0.4 bar (5.8 psi) | |
| Max Flow Rate | 1000 sccm | |
| Heating Elements | Type | Fe-Cr-Al Alloy doped by Mo |
| Temperature Control | Accuracy | ±1 ºC (Optional Eurotherm ±0.1°C) |
| Programmability | 30 segments (Ramping, Cooling, Dwelling) | |
| Thermocouple | Type-K (Four included) | |
| Sliding Mechanism | Rails | Double Linear Sliding Rails (Cr-plated steel) |
| Motor | 208 – 240 VAC Single Phase, 200 W | |
| Power Requirements | Sliding Furnace | AC 208-240V Single Phase, 3 kW |
| Stationary Furnace | AC 208-240V Single Phase, 4 kW | |
| Vacuum & Gas | Vacuum Flanges | Stainless steel with vacuum gauge |
| Max Vacuum | 10E-5 torr (with molecular pump) | |
| Compliance | Standards | CE Certified (NRTL/CSA available) |
Why Choose TU-RT10
- Superior Thermal Flexibility: The unique combination of a stationary three-zone furnace and a slidable single-zone furnace provides the most versatile platform for complex CVD processes available on the market.
- Proven Reliability: Built with premium alloy heating elements and a robust mechanical sliding system, this equipment is engineered for longevity and consistent performance in intensive R&D environments.
- Precision Engineering: With temperature accuracy maintained within ±1°C and high-grade linear motion components, users can achieve highly repeatable results for sensitive material synthesis.
- Scalable and Customizable: The modular design allows for upgrades to Eurotherm controllers for even higher precision and integration with multi-channel gas delivery systems to meet specific research needs.
- Comprehensive Compliance: Our systems are CE certified and built to international safety standards, ensuring easy integration into any professional laboratory or industrial facility.
Contact our technical sales team today for a detailed quote or to discuss a customized configuration tailored to your specific material synthesis requirements.
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