Two Zone IR Heating Rapid Thermal Processing RTP Tube Furnace with 4 Inch ID Quartz Tube and Sliding Sample Holders

Product Overview

This high-performance rapid thermal processing (RTP) system is engineered for advanced material science applications requiring extreme thermal ramps and precise atmospheric control. By utilizing shortwave infrared (IR) heating technology, the equipment facilitates heating rates of up to 50°C/s, making it an essential tool for laboratories focused on the synthesis of two-dimensional materials, superconducting thin films, and semiconductor annealing. The dual-zone configuration allows for independent temperature management across two distinct areas, enabling complex vapor phase reactions where temperature gradients are critical for success.

Designed specifically for Hybrid Physical-Chemical Vapor Deposition (HPCVD), this system provides a sophisticated platform for researchers to evaporate solid sources in one zone while maintaining a controlled deposition environment in the second. The inclusion of dual sliding sample holders drastically improves operational efficiency, allowing for rapid loading, retrieving, and quenching of samples without disrupting the thermal equilibrium of the furnace core. This unit represents a significant leap in thermal processing throughput and consistency for demanding R&D environments.

Constructed with a double-layer steel casing and integrated air-cooling, the equipment ensures a safe external surface temperature even during high-intensity cycles. Reliability is built into every component, from the high-purity fused quartz process tube to the precision-ground sliding rails. This furnace is built to withstand the rigors of continuous industrial research, providing consistent, repeatable results across thousands of operating hours in vacuum or inert gas environments.

Key Features

• Ultra-Fast Shortwave IR Heating: Utilizing sixteen 1.5 kW halogen heating tubes, this system achieves a maximum heating rate of 50°C/s. This allows for rapid thermal annealing and precise control over kinetic-driven material transformations that are impossible with standard resistive heating elements.
• Dual-Zone Independent Control: Two 195 mm heating zones are managed by separate high-precision SCR controllers. This enables the creation of steep thermal gradients or perfectly uniform isothermal zones over a total length of 390 mm, providing maximum flexibility for HPCVD and vapor transport processes.
• Precision Sliding Sample Transport: The unit features dual sliding rails made of chromium-plated steel, supporting two sample holders. This mechanism allows operators to move samples into the hot zone at the exact moment required for flash heating or to pull them into the ambient zone for rapid quenching.
• Advanced PID Temperature Management: Each zone is equipped with a digital controller offering 30 programmable segments. This allows for the automation of complex heating, dwelling, and cooling profiles with an accuracy of ±1°C, ensuring the highest level of repeatability in sensitive thin-film growth.
• Robust Vacuum and Gas Architecture: The furnace is equipped with stainless steel water-cooled flanges, KF25 vacuum ports, and needle valves for precise atmospheric regulation. It can achieve vacuum levels down to 10^-4 Torr with a molecular pump, making it suitable for high-purity oxygen-sensitive processes.
• Integrated PC Interface and Control: An MTS-02 control module is included as standard, enabling users to manage temperature profiles, record real-time data, and monitor thermal performance via a PC. This digital integration is essential for modern data-driven laboratory environments.
• Enhanced Safety and Cooling: The double-layer steel housing features active air cooling to keep the external shell below 60°C. Built-in over-temperature protection and thermocouple broken protection allow for unattended operation with total peace of mind.
• High-Purity Material Path: The process tube is constructed from high-purity fused quartz, measuring 110 mm OD and 106 mm ID. This provides a clean environment for material processing while allowing for visual monitoring of the reaction during high-temperature cycles.

Applications

Technical Specifications

Why Choose This RTP System

Choosing this equipment means investing in a platform designed for the frontier of material science. The combination of ultra-fast IR heating and dual-zone precision allows for experimental workflows that traditional resistive furnaces simply cannot accommodate. Our engineering focuses on minimizing thermal lag and maximizing throughput, ensuring that your research is limited by your imagination, not your hardware.

• Unmatched Thermal Speed: The 50°C/s ramp rate allows for high-throughput testing and the exploration of temperature-sensitive phase diagrams that require rapid quenching.
• Precision Engineered for HPCVD: Unlike single-zone units, this system is optimized for hybrid physical-chemical vapor deposition, giving you the ability to isolate source evaporation from substrate deposition.
• Operational Versatility: Whether operating under high vacuum or inert gas, the system provides consistent performance. The sliding sample holder system is a critical differentiator, reducing sample exposure to unwanted thermal gradients.
• Proven Reliability: Built with premium industrial-grade SCRs, shortwave IR lamps, and high-purity quartz, this unit is designed for a long service life in demanding R&D environments.
• Scalable Control Solutions: From manual operation to full PC-based LabView integration, the system grows with your laboratory's data management requirements.

This system is the gold standard for rapid thermal processing in modern material research. Contact our technical sales team today for a comprehensive quote or to discuss how we can customize this system for your specific vapor deposition or annealing requirements.