900 ºC Max Sliding RTP Tube Furnace with Rapid IR Heating and 4 Inch OD Quartz Tube

RTP Furnace

900 ºC Max Sliding RTP Tube Furnace with Rapid IR Heating and 4 Inch OD Quartz Tube

Item Number: TU-RT26

Maximum Heating Rate: 50 °C/s Process Tube Size: 100 mm O.D. Quartz Maximum Temperature: 900 °C
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Product Overview

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This high-performance sliding Rapid Thermal Processing (RTP) tube furnace represents a significant advancement in laboratory-scale thermal treatment, specifically engineered for material science researchers who require extreme heating and cooling rates. By utilizing a sophisticated infrared (IR) lamp array and a precision-engineered sliding mechanism, the system facilitates rapid thermal cycles that are essential for the synthesis of modern 2D materials, semiconductor wafers, and advanced thin films. The core value of this equipment lies in its ability to achieve precise phase transitions and controlled crystalline growth through its exceptional thermal gradient management.

Designed for the most demanding industrial R&D environments, the unit is particularly effective for growing graphene and carbon nanotubes (CNTs) via Chemical Vapor Deposition (CVD), as well as the specialized fabrication of perovskite solar cells. Its versatility allows it to function under vacuum or controlled atmospheric conditions, providing a flexible platform for diverse heat treatment processes. The integration of high-purity quartz components and stainless steel vacuum hardware ensures a clean, contaminant-free processing environment for sensitive electronic and optical materials.

Reliability and consistency are at the forefront of this system's engineering. The dual-layer steel casing and active air-cooling system are designed to maintain structural integrity and external safety even during high-temperature operations. Every component, from the halogen light tubes to the DC motor-driven sliding rails, is selected for its durability and performance under cyclic thermal stress. This ensures that the equipment delivers repeatable results across thousands of operating hours, providing procurement teams and lead researchers with total confidence in their experimental data and process scalability.

Key Features

  • High-Intensity IR Lamp Heating: The system utilizes an array of eight 1kW halogen light tubes to achieve ultra-fast heating rates of up to 50ºC/s. This allows researchers to reach process temperatures in seconds, minimizing the thermal budget and preventing unwanted diffusion in sensitive semiconductor layers.
  • Automated Sliding Cooling Mechanism: Integrated dual sliding rails allow the furnace body to move away from the sample area automatically upon program completion. Combined with integrated cooling fans, this enables a rapid cooling rate exceeding 8ºC/s, which is critical for quenching phases or stopping chemical reactions instantly.
  • Precision PID Thermal Control: The advanced digital controller supports 30 programmable segments, allowing for complex ramps, dwells, and cooling profiles. With ±1ºC accuracy, the system ensures that every process run adheres strictly to the defined thermal parameters.
  • Optimized Vacuum and Gas Handling: Equipped with stainless steel vacuum flanges and a built-in needle valve, the system supports vacuum levels down to 10^-4 torr with a molecular pump. The hinge-type right flange design facilitates easy sample loading and unloading, while the integrated digital vacuum gauge provides real-time monitoring of chamber conditions.
  • Robust Dual-Layer Construction: The furnace features a double-layer steel casing with air-cooling channels. This design not only protects the internal components during prolonged heating but also ensures the exterior shell remains safe to touch, complying with modern laboratory safety standards.
  • Dual Thermocouple Monitoring: The unit includes two K-type thermocouples. One is dedicated to the PID controller for furnace temperature regulation, while the second is inserted directly into the sample zone for precise monitoring of the actual material temperature during rapid heating and cooling cycles.
  • Expandable PC Interface: A built-in RS485 communication port and the included MTS-02 control module allow for remote operation and data logging via PC. This enables researchers to export thermal profiles for documentation and quality control purposes.

Applications

Application Description Key Benefit
Graphene Synthesis High-temperature CVD processing for the growth of single and multi-layer graphene on metal foils. Rapid ramp rates facilitate controlled nucleation and large grain sizes.
CNT Synthesis Controlled carbon nanotube growth using vapor phase deposition. Precise temperature control ensures uniform diameter and high purity.
Perovskite Solar Cells Thermal annealing and crystallization of perovskite thin films for photovoltaic research. Fast cooling prevents film degradation and optimizes crystal structure.
Wafer Annealing Rapid thermal annealing (RTA) for semiconductor wafers up to 3 inches in diameter. Minimizes dopant diffusion while activating ion-implanted species.
2D Material Research Processing of MoS2, WS2, and other transition metal dichalcogenides. High-speed thermal cycling enables the exploration of metastable phases.
CVD Thin Films Deposition of specialized coatings under vacuum or low-pressure gas flows. Integrated flow meter and vacuum flanges provide a turnkey CVD solution.

Technical Specifications

Parameter Specification Detail for TU-RT26
Model Number TU-RT26
Furnace Structure Double-layer steel casing with air cooling; integrated automatic sliding rails
Maximum Temperature 900°C (for < 1 hour)
Standard Working Temp 800ºC (< 120 min); 600ºC (Continuous)
Heating Rate Max. 50 ºC/s
Cooling Rate Max. 8 ºC/s (1000 - 600ºC range via sliding)
Heating Elements 8 pcs 1Kw Halogen light tubes (2000 hrs life; 200mm heating length)
Process Tube High purity fused quartz; 100mm O.D x 94mm I.D x 1400mm L
Power Requirements AC 208-240V Single Phase, 50/60 Hz; 9KW total power
Sliding System DC motor driven; 1200mm rail length; 340mm sliding range
Sliding Speed 0-70 mm/s (Adjustable via control knob or automated program)
Temperature Control PID automatic controller; 30 programmable segments; ±1 ºC accuracy
Thermocouples Dual K-type (1/4" Dia x 24" L); Control and Sample monitoring
Vacuum System SS Flanges; Hinge-type right flange; KF25 right angle valve
Vacuum Level 10^-2 torr (Mechanical pump); 10^-4 torr (Molecular pump)
Gas Management Built-in flow meter (16-160 ml/min); Needle valve gas fittings
Communications RS485 Port; MTS-02 control module included
Compliance CE Certified; NRTL (UL61010) or CSA available upon request

Why Choose Us

  • Superior Thermal Agility: Unlike traditional tube furnaces, this unit's IR heating technology and automated sliding cooling allow for unparalleled thermal gradients, significantly shortening process cycles and enabling advanced material synthesis.
  • Industrial Grade Reliability: Built with premium components including high-purity quartz and Cr-plated steel rails, this system is designed for high-duty cycles in busy research and production environments.
  • Precision Engineering: Every aspect of the design, from the hinge-type vacuum flanges to the dual thermocouple monitoring, is optimized for ease of use without compromising technical performance.
  • Turnkey Integration: With built-in vacuum gauges, flow meters, and PC control modules, the system arrives ready for immediate deployment in CVD and RTA applications.
  • Global Compliance & Support: CE certification ensures international safety standards are met, backed by our responsive technical team for customization and long-term maintenance support.

For a detailed quote or to discuss how this rapid thermal processing system can be customized for your specific research requirements, please contact our technical sales team today.

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