1100°C Three Zone Tube Furnace with 8.5 to 11 Inch OD Quartz Tube and Vacuum Flanges for Large Wafer Processing

Product Overview

This high-capacity thermal processing system is engineered specifically for large-scale semiconductor wafer processing, advanced material research, and industrial-grade heat treatments. By integrating a massive three-zone heating configuration with large-diameter quartz tubing, the equipment provides an expansive processing volume without sacrificing the thermal precision required for sensitive chemical vapor deposition (CVD) or annealing cycles. The unit is designed to operate continuously at 1100°C, providing a robust platform for high-throughput laboratory environments and pilot production lines that demand repeatable results and high-purity atmospheres.

Targeting the semiconductor, aerospace, and energy storage sectors, this equipment excels in applications ranging from wafer diffusion to the structural optimization of catalyst materials. The three-zone design allows for the creation of precise thermal gradients or a significantly extended uniform heating zone, which is critical for processing larger substrates or multiple samples simultaneously. This versatility makes the system a cornerstone for facilities focused on scaling up material synthesis from benchtop experiments to industrial-ready prototypes.

Built with reliability as a priority, the furnace utilizes a double-layer steel casing and advanced fibrous alumina insulation to ensure operational safety and energy efficiency. The inclusion of hermetic, water-cooled stainless steel flanges allows for high-vacuum operations and controlled atmosphere processing, ensuring that even the most demanding metallurgical or chemical processes are contained within a stable and clean environment. This system represents a significant investment in durability, offering long-term performance under rigorous R&D schedules.

Key Features

• Independent Three-Zone Thermal Control: The system features three distinct heating zones, each measuring 300 mm in length, controlled by individual PID programmable controllers. This allows for a total heating length of 900 mm (approximately 35.4"), providing the operator with the flexibility to establish a 600 mm constant temperature zone or complex thermal gradients required for specialized vapor transport processes.
• Large-Format Quartz Integration: Capable of housing quartz tubes ranging from 8.5" (216 mm) to 11" (279 mm) in outer diameter, the furnace accommodates large-scale wafer boats and oversized industrial components. This high-volume capacity is rare in laboratory-scale tube furnaces, bridging the gap between small-scale research and full industrial production.
• High-Performance FeCrAl Heating Elements: High-quality iron-chromium-aluminum (FeCrAl) resistance wires are strategically embedded within the refractory fibrous alumina insulation. These elements are chosen for their exceptional resistance to oxidation and thermal fatigue, ensuring a long service life even when cycled frequently to maximum operating temperatures.
• Advanced Hermetic Vacuum Sealing: The furnace is equipped with a pair of hinged-style, water-cooled stainless steel flanges. These flanges feature integrated vacuum gauges, needle valves, and KF40 ports, enabling the system to achieve vacuum levels as low as 5e-2 torr with a mechanical pump, or higher with optional turbo-pumping systems.
• Superior Thermal Insulation and Safety: A double-layer steel casing with integrated air cooling ensures that the outer surface temperature remains below 70°C during peak operation. The use of high-purity alumina fiber insulation minimizes heat loss and reduces power consumption, while maintaining high heating and cooling rates of up to 10°C/min.
• Precision PID Instrumentation: Each zone is monitored by dual K-type thermocouples and managed by a 30-segment programmable controller with +/- 1°C accuracy. This level of control is essential for preventing thermal overshoot and ensuring the integrity of delicate substrates during long-duration annealing or diffusion steps.
• Robust Gas Handling Capabilities: The flange assembly includes stainless steel needle valves and quick-connect ports, facilitating the introduction of inert or reactive gases. This makes the system ideal for atmosphere-controlled processes where gas flow and pressure must be strictly maintained.
• Optimized for Wafer Processing: The design supports optional quartz baffle blocks and specialized wafer boats (up to 8" for larger tube variants), making it a turnkey solution for semiconductor annealing, oxidation, and diffusion processes.

Applications

Technical Specifications

Why Choose This Three-Zone Tube Furnace

• Industrial-Grade Throughput: The rare combination of 11" OD tube capacity and a 900mm heating length allows researchers to process large substrates or high volumes of material that typically require industrial-scale equipment.
• Precision Engineering: With triple-zone PID control and +/- 1°C accuracy, this system provides the thermal stability necessary for reproducible material science and semiconductor fabrication.
• Advanced Safety and Stability: The double-walled casing design and water-cooled flanges ensure a safe laboratory environment and protect the system's internal seals during high-temperature, long-duration cycles.
• High-Vacuum Integrity: Engineered with hinged hermetic flanges and KF40 ports, the system is designed for high-purity processes requiring vacuum levels as low as 5e-2 torr, making it suitable for cleanroom environments.
• Customizable Control Options: Beyond the standard PID configuration, this unit can be upgraded with Eurotherm 3000 series controllers and Labview-based software for advanced recipe editing and automated data logging.

Our technical team is ready to assist with custom configurations or specific process requirements to ensure this system meets your exact R&D or production needs. Contact us today for a detailed quote or to discuss your thermal processing specifications.