RTP Furnace
1200C Max Dual Sliding Tube Furnace with 50 mm Tube Flanges for CVD
Item Number: TU-RT05
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Product Overview



This high-performance dual-zone sliding system represents a breakthrough in thermal processing for advanced material research. Designed specifically for chemical vapor deposition (CVD) and physical vapor transport (PVT) applications, the equipment features two independent heating units mounted on a precision-engineered sliding rail. This configuration allows for unprecedented control over temperature gradients and rapid thermal cycling, enabling researchers to achieve complex synthesis profiles that are impossible with stationary systems. By moving the heating zones relative to the processing tube, users can create localized hot spots for precursor evaporation while maintaining a distinct temperature for substrate deposition.
Built for the rigors of industrial R&D and semiconductor laboratory environments, the unit facilitates the production of high-quality thin films, 2D materials, and nanostructures. The primary value proposition lies in its versatility: it functions as a dual-zone furnace for controlled gradient growth or as a high-speed thermal quenching tool for investigating phase transitions. Target industries include aerospace, energy storage (specifically perovskite solar cell development), and microelectronics, where precision and repeatability are the foundations of successful innovation.
Engineered with a focus on long-term reliability, the system utilizes a robust double-layer steel structure to ensure external safety and thermal efficiency. The heavy-duty sliding rails are designed for smooth, consistent motion even after thousands of cycles at high temperatures. Every component, from the doped Fe-Cr-Al alloy heating elements to the hermetic stainless steel flanges, is selected to withstand the demanding conditions of high-vacuum and corrosive gas environments. This commitment to engineering excellence ensures that the equipment delivers consistent performance, day after day, in the most challenging research scenarios.
Key Features
- Independent Dual-Zone Control: Two separate furnace units, each with a 200mm heating zone, allow for independent PID programming. This enables the simultaneous management of precursor sublimation and substrate growth temperatures, which is critical for complex CVD recipes.
- Precision Slidable Rail System: The equipment is mounted on a 1200mm double sliding rail system. This allows operators to manually or (optionally) automatically move the furnaces across a 400mm distance, providing a physical mechanism for rapid temperature changes and quenching.
- Advanced Thermal Dynamics: By sliding the heated furnace away from the sample location, the system can achieve heating and cooling rates up to 100°C/min. This rapid thermal processing (RTP) capability is essential for controlling grain size and crystal structure in advanced thin films.
- High-Performance Heating Elements: Equipped with Fe-Cr-Al alloy elements doped with Molybdenum, the unit provides stable and durable heating performance up to 1200°C, ensuring a long service life even under continuous high-temperature operation.
- Hermetic Vacuum Flanges: Stainless steel vacuum flanges with integrated gauges and heavy-duty supports come standard. These ensure a leak-tight environment, supporting vacuum levels down to 10E-5 torr when paired with a molecular pump.
- Programmable PID Automation: Each zone is governed by an automatic controller featuring 30 programmable segments. This allows for precise control over ramp rates, dwell times, and cooling curves, reducing the risk of human error during complex cycles.
- Integrated Safety Protections: The system includes built-in over-temperature alarms and automatic shutdown features. The double-layer steel housing design incorporates air cooling to keep the furnace surface safe to touch during operation.
- Modular System Expansion: The equipment is designed to grow with your research needs. It can be easily upgraded with Mass Flow Controllers (MFC) for precise gas delivery, RF plasma generators for PECVD, or motorized rail kits for automated sliding cycles.
Applications
| Application | Description | Key Benefit |
|---|---|---|
| Perovskite Synthesis | Precise control of MAI and lead halide evaporation and deposition zones. | Fine-tunes grain size and film uniformity for solar efficiency. |
| 2D Material Growth | Growth of Graphene, MoS2, and WS2 via chemical vapor deposition on various substrates. | Achieves high-quality, large-area monolayer films with repeatable results. |
| Thermal Quenching | Moving the furnace rapidly to achieve cooling rates of 100°C/min. | Locks in high-temperature phases and prevents grain growth during cooling. |
| Sublimation/Purification | Separating materials based on their distinct evaporation and condensation temperatures. | Produces high-purity precursors for semiconductor manufacturing. |
| Nanowire Fabrication | VLS (Vapor-Liquid-Solid) growth requiring distinct source and catalyst temperatures. | Enables precise control over nanowire morphology and length. |
| Vacuum Heat Treatment | Annealing or stress-relieving materials under controlled atmosphere or vacuum. | Prevents oxidation and contamination of sensitive industrial alloys. |
Technical Specifications
| Parameter | Specifications for TU-RT05 |
|---|---|
| Furnace Structure | Dual slidable double-layer steel units on 1200mm rails |
| Max. Working Temperature | 1200°C (< 1 hour) |
| Continuous Working Temp. | 1100°C |
| Max Sliding Distance | 400 mm (Manual standard; Motorized optional) |
| Heating Zone Length | 200 mm (8") per furnace (400 mm total) |
| Constant Temp. Zone | 60 mm (+/- 3°C @ 800°C) per furnace |
| Max. Heating/Cooling Rate | ~100°C/min (Achieved by sliding the furnace) |
| Standard Heating Rate | 15°C/sec (RT-150°C) to 0.5°C/sec (800°C-1000°C) |
| Standard Cooling Rate | 15°C/sec (1000-950°C) to 0.5°C/sec (400°C-300°C) |
| Heating Elements | Fe-Cr-Al Alloy doped by Mo |
| Tube Material/Size | Quartz Tube; 50mm O.D x 44mm I.D x 1500 mm L |
| Optional Tube | S310 high-temp alloy tube for high pressure (100 PSI) |
| Vacuum Flanges | Stainless steel with vacuum gauge and heavy-duty support |
| Vacuum Level | 10E-2 torr (Mechanical pump) to 10E-5 torr (Molecular pump) |
| Temperature Controller | Dual PID automatic control, 30 programmable segments |
| Temperature Accuracy | +/- 1°C |
| Power Supply | AC 208-240V Single Phase, 50/60 Hz, 20A total |
| Total Power | 2.5 KW |
| Compliance | CE Certified (NRTL/CSA available upon request) |
Why Choose TU-RT05
- Superior Thermal Flexibility: The dual sliding design offers a level of process control that stationary furnaces cannot match, specifically for rapid quenching and gradient-controlled CVD.
- Precision Engineering: Built with premium components including Mo-doped alloy elements and high-grade stainless steel flanges, ensuring high-vacuum integrity and temperature stability.
- Future-Proof Scalability: Whether you need a simple CVD setup today or a fully automated PECVD system tomorrow, this unit supports seamless upgrades with MFCs and RF generators.
- Unmatched Cooling Efficiency: The physical separation of the heating chamber from the processing tube allows for true rapid cooling, critical for metallurgical and semiconductor research.
- Proven Reliability: With thousands of units in operation globally, our design is the industry standard for durability and operational consistency in high-temperature research.
Contact us today for a custom configuration or to receive a formal quotation for your laboratory's specific CVD requirements.
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