Dual Tube 100mm 80mm CVD Sliding Furnace with 4 Channel Gas Mixing and Vacuum System

Product Overview

This high-performance thermal processing system is engineered for advanced Chemical Vapor Deposition (CVD) applications, specifically designed to facilitate the growth of thin films and graphene on metal foils. By utilizing a unique dual-tube architecture, the equipment allows for precise control over the reaction environment. The system's primary value proposition lies in its ability to handle the preparation of flexible electrodes on metallic substrates, a critical requirement for the next generation of energy storage and electronic research. This unit integrates heating, gas delivery, and vacuum control into a single, cohesive platform, ensuring streamlined workflows for material scientists.

The equipment is particularly suited for industrial R&D environments and academic laboratories focused on two-dimensional materials and nanotechnology. Its primary use cases include the large-scale production of graphene films and the synthesis of complex nanostructures that require strict atmosphere control. This system provides a versatile environment where reactive gases are precisely metered into a narrow 10mm reaction space between concentric quartz tubes, maximizing precursor efficiency and film uniformity. The sliding mechanism further enhances the unit's utility, allowing for rapid thermal cycling that is essential for specific phase transformations and high-throughput experimentation.

Built with industrial-grade components, the furnace offers unmatched reliability under demanding conditions. The high-purity alumina insulation and robust stainless steel vacuum flanges are designed to withstand continuous operation at elevated temperatures. Every aspect of this system, from the digital mass flow controllers to the heavy-duty vacuum station, reflects a commitment to precision engineering. Researchers can rely on this unit for consistent, reproducible results, whether performing routine heat treatments or complex multi-stage CVD synthesis processes in a controlled atmosphere.

Key Features

• Concentric Dual-Tube Architecture: The system employs a 100mm diameter exterior tube and a suspended 80mm diameter interior tube, creating a 10mm reaction gap where metallic foil substrates can be wrapped for optimal CVD surface area and gas interaction.
• Dynamic Sliding Rail System: A heavy-duty sliding rail is integrated into the bottom of the furnace, enabling the heating chamber to be moved quickly away from the sample zone. This allows for rapid quenching or fast heating rates that are impossible with stationary furnaces.
• Precision 4-Channel Gas Delivery: The integrated gas mixing station features four digital Mass Flow Controllers (MFC) with varying ranges (100 to 500 SCCM), allowing for the complex blending of precursor and carrier gases with ±1% full-scale accuracy.
• Advanced PID Thermal Regulation: The equipment utilizes a sophisticated PID controller with 30 programmable segments, providing meticulous control over heating rates, dwell times, and cooling curves to maintain ±1°C temperature stability.
• Integrated Vacuum and Pressure Monitoring: A comprehensive vacuum station is included, featuring a two-stage rotary vane pump and a digital vacuum gauge capable of measuring from 10^-4 to 1000 Torr, ensuring a clean and controlled reaction environment.
• Robust Water-Cooled Flanges: Stainless steel 304 flanges are equipped with integrated water-cooling jackets, protecting the high-vacuum seals and ensuring structural integrity during prolonged high-temperature operations.
• Optimized Thermal Insulation: The heating chamber is constructed from high-purity Al2O3 fibrous insulation, which minimizes heat loss and provides excellent temperature uniformity across the entire constant heating zone.
• Scalable Heating Configurations: Available in both single and dual heating zone configurations, the system allows for independent control of temperature gradients, which is essential for transporting precursors or managing multi-stage reactions.
• Safety and Automation: Built-in over-temperature alarms and automatic protection features allow the system to operate safely without constant supervision, increasing laboratory efficiency and reducing operational risk.
• Industrial Swagelok Connectivity: All gas inlets and outlets utilize 1/4" Swagelok tube connectors, ensuring leak-free performance and compatibility with standard industrial gas handling infrastructure.

Applications

Technical Specifications

Why Choose TU-RT12

• Superior Engineering for Graphene Research: The dual-tube design is specifically optimized for roll-to-roll style foil wrapping, providing the most efficient configuration for large-area graphene and 2D material synthesis available in a laboratory scale.
• Unmatched Thermal Agility: The sliding furnace design provides researchers with the critical ability to achieve ultra-fast cooling rates or transition samples between temperature zones instantly, which is vital for controlling grain growth and phase purity.
• Turnkey Gas and Vacuum Integration: Unlike modular setups that require extensive assembly, this system arrives with a fully integrated 4-channel MFC station and a matching vacuum pump station, ensuring high-purity atmosphere control from day one.
• Built for Long-Term Industrial Use: From the heavy-duty mobile cart to the high-grade stainless steel flanges and Al2O3 insulation, every component is selected for durability and consistent performance in high-duty cycle R&D environments.
• Precision and Customizability: With options for single or dual-zone control and the ability to integrate Eurotherm controllers or custom gas configurations, this system can be tailored to the exact requirements of your specific CVD process.

Contact THERMUNITS today for a technical consultation or to receive a formal quotation for your laboratory's custom thermal processing requirements.