High Temperature 1200C Split Tube Furnace with Internal Travel Mechanism for HPCVD and Crystal Growth Research

RTP Furnace

High Temperature 1200C Split Tube Furnace with Internal Travel Mechanism for HPCVD and Crystal Growth Research

Item Number: TU-RT07

Maximum Working Temperature: 1200°C Temperature Control Accuracy: ±1°C Internal Travel Range: 100 mm
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Product Overview

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This high-temperature processing system is a sophisticated 2-inch split tube furnace engineered for advanced material synthesis and thermal research. At its core, the unit integrates a specialized internal traveling mechanism that allows researchers to precisely control the position of the sample boat or crucible within the heating chamber while under vacuum. This capability is fundamental for processes that require dynamic movement through a thermal gradient, providing a versatile platform for hybrid physical-chemical vapor deposition (HPCVD) and high-purity crystal growth. The split-furnace design further enhances operational efficiency, allowing for rapid cooling and easy access to the processing tube.

Designed for the most demanding laboratory environments, this equipment serves as a critical tool for researchers in material science, semiconductor development, and solid-state chemistry. By facilitating multi-functional thermal processing—including rapid thermal evaporation (RTE) and Horizontal Bridgman Crystal Growth—the system empowers users to explore new-generation crystal structures and complex thin-film layers. The integration of high-purity quartz and precision-engineered stainless steel components ensures that the processing environment remains free from contamination, even when operating at temperatures reaching 1200°C.

Reliability and consistency are the hallmarks of this thermal processing unit. Built with industrial-grade heating elements and a robust PLC-controlled drive system, it delivers repeatable performance across hundreds of cycles. The combination of advanced PID temperature regulation and mechanical precision ensures that experimental conditions are maintained with extreme accuracy. Whether utilized for small-scale prototype development or fundamental material characterization, this system provides the stability and control necessary for cutting-edge industrial R&D and high-stakes academic research.

Key Features

  • Precision Internal Traveling Mechanism: The equipment is outfitted with a specialized 24VDC, 100W stepper motor that drives the sample boat inside the quartz tube. This allows for controlled linear movement up to 100mm at a constant speed, which is essential for directional solidification and graduated thermal exposure.
  • Integrated PLC Touch Screen Control: A centralized digital interface manages both the thermal profile and the mechanical travel distance. This integration allows users to synchronize temperature changes with sample positioning, a critical requirement for complex vapor deposition protocols.
  • Rapid Thermal Processing (RTP) Capability: By moving the sample stage into or out of a pre-heated hot zone, this system can achieve significantly higher heating and cooling rates than stationary furnaces, effectively mimicking RTP conditions for thin-film annealing.
  • High-Purity Quartz Thermal Field: The system utilizes a premium quartz processing tube, providing excellent chemical inertness and thermal shock resistance. This ensures that no impurities are introduced to the reaction atmosphere, even during high-temperature gas-phase reactions.
  • Superior Vacuum and Atmosphere Control: The unit features vacuum-sealed flanges with stainless steel bellows that remain airtight even while the internal mechanism is in motion. This allows for stable processing under high vacuum levels or controlled inert gas environments.
  • Advanced PID Temperature Regulation: Utilizing a 30-step programmable controller with solid-state relay technology, the system maintains a precision of ±1°C. This ensures a stable 60mm constant temperature zone, critical for maintaining uniform crystal growth rates.
  • Split-Furnace Engineering: The split-hinge design of the furnace body allows for rapid cooling of the tube and facilitates the quick exchange of samples or processing tubes, maximizing laboratory throughput.
  • Expandable Multi-Zone Options: For processes requiring more complex thermal gradients, the unit can be upgraded to a dual-zone configuration, providing extended constant temperature zones or steeper gradients as required by the application.

Applications

Application Description Key Benefit
HPCVD Hybrid Physical-Chemical Vapor Deposition involving reactant gases and evaporation vapor. Precise control over gas mixing and deposition location.
RTE Rapid Thermal Evaporation where materials are moved into the hot zone for instant vapor phase change. Minimizes thermal stress on substrates and improves film purity.
Bridgman Growth Growing single crystals by moving a crucible through a controlled thermal gradient. Enhances crystal structural integrity through steady solidification.
CNT Synthesis Synthesis of Vertically Aligned Carbon Nanotubes using carrier and reaction gases. Uniform carbon source delivery and stable thermal environment.
Thin Film Annealing Rapid heating and cooling of deposited layers to modify grain structure. Precise control over phase transitions and material properties.
Directional Solidification Controlling the cooling direction of molten materials to influence microstructure. Improved mechanical properties and grain alignment in alloys.
Semiconductor Doping Introducing impurities into semiconductor wafers at specific temperatures. High uniformity across the sample surface via motion control.
Vapor Phase Transport Utilizing chemical transport agents to grow high-purity crystals from vapor. Excellent spatial control over source and growth zones.

Technical Specifications

System Configuration: TU-RT07

Feature Specification Details
Power Supply 208 - 240 VAC, 50/60Hz, 1.2 KW Max
Max. Working Temp 1200°C (Short-term); 1100°C (Continuous)
Quartz Tube Dimensions 50mm O.D x 44mm I.D x 450mm L
Heating Zone Length 200 mm (8")
Constant Temp Zone 60 mm (±1°C @ 1000°C)
Temperature Control PID automatic control, 30 steps programmable
Control Accuracy ±1°C via K-type thermocouple
Travel Mechanism 24VDC Stepper motor (100W)
Max Travel Distance 100 mm (inside vacuum-sealed tube)
Traveling Speed 180 mm/min (Constant)
Vacuum Flanges 2" quick clamp with 1/4" fittings and needle valve
Vacuum Level 10^-2 torr (Mechanical pump); 10^-5 torr (Turbopump)
Safety Compliance CE Certified (NRTL/CSA available upon request)
Sample Boat 50 x 20 x 20mm Mini-crucible boat (~20ml)

Typical Heating & Cooling Rates (via Sample Motion)

Temperature Range Heating Rate (Max) Cooling Rate (Max)
950°C - 850°C 0.5°C/sec 7°C - 10°C/sec
650°C - 550°C 1.0°C - 2.0°C/sec 1.5°C - 2.0°C/sec
250°C - 150°C 10°C/sec N/A

Why Choose This System

  • Engineered for Precision: This system is not merely a furnace but a precision instrument, combining high-accuracy thermal control with reliable mechanical motion for repeatable scientific results.
  • Versatile Research Platform: The ability to perform HPCVD, RTE, and Bridgman growth in a single unit makes this an exceptionally cost-effective solution for multi-disciplinary material labs.
  • Robust Construction: Utilizing high-purity quartz and industrial-grade electronics, the equipment is designed for long-term operational consistency under high-vacuum and high-temperature conditions.
  • Customizable Solutions: We offer extensive customization, including sample holder modifications (AIN or Graphite), variable speed travel control, and multi-channel gas delivery systems to meet specific research needs.
  • Comprehensive Compliance: CE certification ensures that the system meets rigorous safety standards, with optional NRTL or CSA certifications available for specific laboratory requirements.

This precision-engineered furnace represents a premium investment in your facility's research capabilities. Contact our technical sales team today to discuss your specific process requirements or to request a formal quotation for a customized thermal solution.

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