Tube Furnace
1200C High Temperature 5 Inch Split Vacuum Tube Furnace with 12 Inch Heating Zone and Separated PID Controller
Item Number: TU-22
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Product Overview


This high-performance split tube furnace represents a pinnacle in compact, energy-efficient thermal processing technology. Engineered for precision and versatility, the system offers a maximum operating temperature of 1200°C, making it an essential tool for material science laboratories and industrial R&D centers. The split-hinge design allows for rapid cooling and effortless loading and unloading of samples, while the large-diameter quartz tube accommodates substrates up to 4 inches in diameter. By integrating advanced insulation materials and a separated control module, the equipment delivers exceptional thermal stability and long-term operational reliability in demanding environments.
Designed to meet the rigorous requirements of modern research, this unit is widely utilized for annealing, sintering, and chemical vapor deposition (CVD) processes. Its capability to operate under high vacuum or controlled atmospheric conditions provides researchers with the flexibility needed to synthesize 2D materials, conduct semiconductor wafer processing, and perform complex heat treatments. The separated controller architecture ensures that the sensitive electronic components are shielded from the high heat of the furnace body, significantly extending the service life of the electronics and ensuring consistent performance across thousands of cycles.
Reliability is at the core of this system's engineering. All electrical components are NRTL certified, ensuring compliance with strict safety standards for laboratory use. The furnace utilizes a double-layer steel structure combined with high-purity Al2O3 fibrous insulation and a refractory ceramic coating to minimize heat loss and maximize energy savings. This robust build quality ensures that the equipment remains cool to the touch on the exterior while maintaining precise internal temperature uniformity, providing a safe and productive workspace for technicians and scientists alike.
Key Features
- Precision Split-Hinge Design: The furnace body is engineered with a split-opening mechanism that allows for rapid sample access and accelerated cooling phases, significantly improving laboratory throughput and experimental flexibility.
- Large-Diameter Quartz Processing Tube: Equipped with a 5-inch (130mm) O.D. high-purity quartz tube, this unit is capable of processing large substrates, including semiconductor wafers up to 4 inches in diameter, without compromising thermal uniformity.
- Separated Digital Control Module: The 30-step programmable PID controller is housed in a separate enclosure, isolating critical electronic components from the thermal radiation of the furnace to ensure maximum precision and equipment longevity.
- High-Efficiency Fibrous Insulation: Utilizing high-purity Al2O3 fibrous insulation with a specialized alumina coating, the furnace achieves superior energy efficiency and a longer service life compared to traditional refractory materials.
- Advanced Vacuum Sealing System: A pair of stainless steel 304 vacuum flanges with double high-temperature silicone O-rings provides a reliable seal, allowing for vacuum levels down to 10-2 Torr with a standard mechanical pump.
- Integrated Safety and Certification: The system features built-in over-temperature and thermocouple failure protection, and all electrical parts carry NRTL certification, meeting the highest safety standards for industrial and academic laboratories.
- Flexible Gas and Vacuum Management: Standard KF25 ports and 1/4" barb fittings enable seamless connection to vacuum pumps and gas delivery systems, supporting both static and flowing atmosphere processes.
- Superior Heating Elements: Fe-Cr-Al alloy elements doped with molybdenum provide stable and consistent heating up to 1200°C, ensuring the durability required for repetitive high-temperature cycles.
Applications
| Application | Description | Key Benefit |
|---|---|---|
| Semiconductor Wafer Annealing | High-temperature treatment of silicon or compound semiconductor wafers to modify electrical properties. | Accommodates wafers up to 4" with exceptional thermal uniformity. |
| 2D Material Synthesis | Synthesis of graphene, MoS2, and other thin-film materials via CVD or thermal processing. | Precise flow control and vacuum integrity ensure high-quality film growth. |
| Sintering of Ceramics | Consolidating ceramic powder compacts into dense, high-strength components under vacuum or inert gas. | Split design allows for easy loading of fragile green bodies. |
| Atmospheric Calcination | Heating mineral or chemical substances in controlled gas environments to drive off volatile fractions. | Versatile gas inlet/outlet allows for precise chemical reactions. |
| Vacuum Degassing | Removal of trapped gases from specialized alloys or composite materials to improve structural integrity. | High-performance flanges maintain stable vacuum levels throughout the cycle. |
| Battery Material Research | Heat treatment of cathode and anode materials in inert atmospheres to optimize electrochemical performance. | Uniform 12" heating zone provides consistent material properties. |
| Coating Stress Relief | Relieving internal stresses in specialized coatings applied to metallic or ceramic substrates. | Programmable cooling rates prevent thermal shock and coating delamination. |
| Catalyst Preparation | Thermal activation of catalytic materials under specific gas flow conditions. | Separated controller allows for safe integration within laboratory fume hoods. |
Technical Specifications
| Parameter | Specification for TU-22 |
|---|---|
| Max. Operating Temperature | 1200°C (< 1 hour) |
| Continuous Operating Temp. | 1100°C |
| Heating Zone Length | 12" (300 mm) |
| Constant Temperature Zone | 100 mm (±1ºC) / 140 mm (±2ºC) |
| Tube Material & Size | High-purity Quartz; 5" O.D. x 4.7" I.D. x 29.5" L (130 x 120 x 750 mm) |
| Heating Elements | Mo-doped Fe-Cr-Al Alloy |
| Max. Heating Rate | ≤ 20°C/min |
| Temperature Accuracy | ± 1°C |
| Temperature Control | PID 30-step programmable via solid-state relay |
| Furnace Structure | Double-layer steel with high-purity Al2O3 fibrous insulation |
| Power / Voltage | 3 KW / 220VAC 50/60Hz |
| Vacuum Level | 10-2 Torr (with mechanical pump) |
| Vacuum Flanges | Stainless steel 304 with double silicone O-rings; KF25 port included |
| Pressure Monitoring | Standard mechanical gauge (-0.1 to 0.15 Mpa) |
| Fittings | 1/4" barb fitting for gas inlet; KF25 for vacuum outlet |
| Certifications | NRTL Certified electrical components |
| Optional Upgrades | PC control module, Eurotherm controller, Digital vacuum gauge, Water-cooled flanges |
Why Choose TU-22
- Unmatched Thermal Precision: The combination of a 30-step programmable PID controller and high-grade Fe-Cr-Al alloy heating elements ensures that your experiments are repeatable and accurate to within ±1°C.
- Optimized for High Throughput: The split-furnace design is a critical advantage for busy labs, allowing for rapid natural cooling and simplifying the process of exchanging samples between runs.
- Robust Safety Engineering: With NRTL certification and advanced protection features like over-temperature and thermocouple failure alerts, this system is designed for safe, unattended operation in professional environments.
- Future-Proof Versatility: The modular design of the TU-22 allows for significant customization, including PC-based control, high-precision Eurotherm controllers, and water-cooled flanges for extended high-temperature work.
- Industrial-Grade Build Quality: From the high-purity alumina-coated refractory ceramics to the stainless steel 304 vacuum components, every aspect of this furnace is built for long-term durability and minimal maintenance.
Contact THERMUNITS today to request a quotation or to discuss a customized thermal solution tailored to your specific material research requirements.
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