Split Chamber CVD Tube Furnace with Vacuum Station Chemical Vapor Deposition System Machine

Product Overview

This high-performance split chamber chemical vapor deposition system is engineered for sophisticated material synthesis and thin-film research in advanced laboratory environments. By integrating a high-temperature tube furnace with a precision-controlled gas delivery manifold and a robust vacuum station, the equipment provides a comprehensive solution for laboratories requiring exact control over thermal and atmospheric conditions. Its split-frame architecture is specifically designed to facilitate easy access to reaction tubes and substrates, significantly reducing downtime between experimental runs while allowing for rapid cooling protocols that are essential for certain material crystalline structures.

Primarily utilized in semiconductor manufacturing, nanotechnology, and advanced ceramics, this system supports a diverse range of processes including graphene growth, carbon nanotube synthesis, and various thin-film coatings. The versatile design accommodates diverse precursors and carrier gases, making it an essential tool for research institutes and industrial R&D centers focused on next-generation electronic and optoelectronic materials. Whether performing routine annealing or complex multi-stage chemical vapor deposition sequences, the unit maintains a stable environment to ensure reproducible results across every batch, adhering to the strictest industrial standards.

Built with industrial-grade components and a focus on long-term reliability, this furnace system excels under demanding continuous operation cycles. The combination of high-purity alumina fiber insulation and precision-wound heating elements ensures superior thermal efficiency and temperature uniformity. Users can rely on the integrated safety protocols, such as automated over-temperature protection and thermocouple failure detection, to protect sensitive samples and maintain operational integrity in high-stakes laboratory environments. This equipment represents a premium investment for facilities prioritizing precision, durability, and operational consistency.

Key Features

• Radio Frequency Glow Enhancement: This system utilizes optional radio frequency glow technology to significantly boost the film deposition rate, reaching up to 10Å/S. This capability is critical for high-throughput production and rapid prototyping in competitive research fields.
• Superior Large-Area Uniformity: Incorporating advanced multi-point RF feed technology and specialized gas path distribution, the furnace ensures film uniformity of better than 8%. This level of consistency is vital for creating high-quality coatings across large substrates.
• Split-Chamber Sliding Mechanism: The furnace body features a specialized sliding system that allows the chamber to be moved along the rail. This enables rapid cooling of the process tube and facilitates intuitive observation of the reaction samples without disturbing the vacuum seal.
• Precision Mass Flow Control: The equipment is outfitted with a 4-channel MFC gas control unit, providing digital regulation of source gases such as CH4, H2, O2, and N2. With a linearity of ±0.5% F.S. and repeatability of ±0.2% F.S., it ensures the exact stoichiometry required for high-purity synthesis.
• Intelligent PID Control Interface: A high-performance 7-inch TFT touch screen controller utilizes a closed-loop negative feedback mechanism. This system ensures ±1°C temperature accuracy and allows for complex programming of heating, soaking, and cooling segments.
• High-Vacuum Compatibility: The integrated vacuum station features a standard 4L/S rotary vane pump capable of reaching 10 Pa, with an optional turbo-molecular pump upgrade that achieves high vacuum pressures of 6x10^-5 Pa for ultra-pure deposition environments.
• Industrial-Grade Heating Elements: Utilizing Cr2Al2Mo2 wire coils embedded in high-purity Japan-imported alumina fiber, the system provides a maximum working temperature of 1200℃ with exceptional thermal recovery and energy efficiency.
• Robust Safety Architecture: The unit includes built-in over-current and over-temperature alarms that automatically disconnect power to prevent damage. It also features a power failure restart function, allowing the system to resume heating programs once power is restored.
• Versatile Flange Design: Stainless steel vacuum flanges with double-ring silicone seals provide a leak-tight environment. These flanges are designed with adaptable ports to accommodate different vacuum gauges, sensors, or additional precursor inlets.

Applications

Technical Specifications

Standard Package Includes:

• Split Chamber Furnace (TU-CVD02 Base Unit)
• High-Purity Quartz Tube
• Stainless Steel Vacuum Flanges (Pair)
• Alumina Tube Thermal Blocks
• Precision Gas Control Manifold (4-Channel MFC)
• Vacuum Pump Station
• Heat Resistant Safety Gloves
• Comprehensive Operation Manual

Why Choose This Product

• Precision-Engineered Consistency: Designed with advanced semiconductor-grade components, this system limits substrate-to-substrate deviation to less than 2%, ensuring that your research results are repeatable and scalable for industrial application.
• Enhanced Laboratory Efficiency: The split chamber design and sliding rail system allow for rapid thermal cycling. By cooling the samples quickly after deposition, researchers can complete more experimental cycles in a single shift compared to traditional fixed-chamber furnaces.
• Robust Safety and Compliance: Every unit is equipped with multi-layered safety protocols, including automatic power-off during over-temperature events and advanced thermocouple monitoring, providing peace of mind during overnight or long-duration runs.
• Customizable Gas and Vacuum Configurations: We recognize that every R&D project is unique. The system's modular gas manifold and vacuum ports allow for easy upgrades, such as adding toxic gas sensors, additional MFC channels, or ultra-high vacuum turbo stations.
• Superior Thermal Management: The use of premium Japan-imported alumina fiber insulation results in a low thermal mass chamber that reacts quickly to temperature changes while keeping the external casing cool and energy-efficient.

Our commitment to engineering excellence ensures that this equipment serves as a reliable, long-term asset for your facility. Contact our technical sales team today to discuss your specific process requirements or to request a customized quote for your research application.