RTP Furnace
Two Zones CSS Furnace for Rapid Thermal Processing Thin Film Coating 3 Inch Diameter 650C
Item Number: TU-RT30
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Product Overview

This specialized two-heating zone rapid thermal processing system is engineered for the high-precision demands of material science and industrial R&D. Specifically designed to facilitate Close Spaced Sublimation (CSS) and Physical Vapor Deposition (PVD) film coating processes, the equipment accommodates substrates up to 3 inches in diameter or 2x2 inch squares. By integrating a dual-zone heating architecture, this unit provides researchers with the critical ability to establish precise thermal gradients between the source material and the substrate, which is essential for the growth of high-quality crystalline thin films. Its versatile design makes it an indispensable tool for developing next-generation photovoltaic technologies and exploring advanced semiconductor materials.
Targeting the renewable energy and semiconductor sectors, this thermal processing unit excels in the fabrication of Cadmium Telluride (CdTe), Perovskite, and Antimony Selenide (Sb2Se3) solar cells. The equipment's robust construction features an 11-inch O.D. high-purity fused quartz chamber supported by a mobile aluminum alloy frame, ensuring both structural integrity and operational flexibility. By utilizing shortwave infrared halogen heaters, the system achieves rapid thermal cycling that traditional muffle furnaces cannot match, significantly reducing processing times and improving throughput in laboratory environments where experimental iteration is key.
Confidence in reliability is a hallmark of this equipment's design. It features dual 30-segment programmable temperature controllers that maintain a stringent accuracy of +/-1ºC, ensuring that even the most sensitive thermal profiles are executed with absolute consistency. The inclusion of stainless steel vacuum flanges with double silicone O-ring seals allows the system to reach high vacuum levels, protecting sensitive materials from oxidation and contamination. This combination of precision engineering and heavy-duty components ensures that the system delivers repeatable results under the demanding conditions of modern industrial research.
Key Features
- Dual-Zone Independent Thermal Control: The system incorporates two distinct heating groups (Top and Bottom) managed by separate precision controllers. This allows for the creation of specific temperature differentials between the evaporation source and the substrate, which is vital for controlling grain growth and film thickness in CSS processes.
- High-Efficiency Infrared Halogen Heating: Utilizing shortwave IR lamps as heating elements, the unit achieves rapid heating and cooling cycles. This technology enables heating rates up to 20ºC/s and cooling rates up to 10ºC/s, minimizing thermal lag and maximizing process efficiency for rapid thermal processing (RTP) applications.
- Adjustable Inter-Heater Spacing: To accommodate varying process requirements and vapor transport dynamics, the distance between the top and bottom heaters can be adjusted manually from 10 mm to 50 mm. This flexibility allows users to fine-tune the sublimation gap for different material chemistries.
- High-Purity Quartz Reaction Chamber: The chamber is constructed from high-purity fused quartz with an 11" O.D., providing an ultra-clean environment for thin-film deposition. Quartz's excellent thermal shock resistance and chemical inertness ensure that no impurities are introduced into the delicate coating process.
- Water-Cooled Heater Jackets: The heaters are encased in stainless steel water-cooled jackets. This design significantly reduces heat radiation to the surrounding environment and the furnace frame, while also enabling the rapid cooling necessary for quenching processes and high-turnover experimental workflows.
- Precision Substrate Uniformity Tools: A 3-inch round wafer holder is built into the top heater, complemented by a high thermal conductivity Aluminum Nitride (AlN) plate. This plate acts as a thermal buffer, distributing heat evenly across the back of the substrate to eliminate hot spots and ensure uniform film deposition.
- Advanced Vacuum and Gas Management: The system is equipped with dual gas flow meters for precise atmospheric control and purging. Stainless steel 316 flanges with KFD-25 ports facilitate connection to high-vacuum pump systems, achieving pressures as low as 10E-5 Torr when paired with molecular pumps.
- Integrated Digital Monitoring and Software: A built-in RS485 port and dedicated control software allow for full PC-based operation. Researchers can program complex temperature profiles, log real-time data, and monitor vacuum levels via the anti-corrosion digital vacuum gauge for complete process transparency.
Applications
| Application | Description | Key Benefit |
|---|---|---|
| CdTe Solar Cell Fabrication | Utilization of the CSS process to deposit Cadmium Telluride films onto glass substrates for high-efficiency PV research. | Precise gradient control leads to improved grain structure and cell efficiency. |
| Perovskite Thin Film Growth | Vapor-assisted solution processing for the creation of planar heterojunction perovskite solar cells. | Rapid thermal cycling minimizes the risk of perovskite degradation during processing. |
| Sb2Se3 Photovoltaics | Development of antimony selenide thin films with oriented one-dimensional ribbons for advanced light harvesting. | Enhanced control over vapor transport dynamics via adjustable heater spacing. |
| Semiconductor Annealing | Rapid thermal annealing (RTA) of thin films to activate dopants or repair lattice damage in silicon or compound wafers. | Faster processing times compared to conventional tube furnaces with minimal thermal budget. |
| CSS Coating Research | Experimental coating of various materials using Close Spaced Sublimation under vacuum or controlled atmospheres. | High purity environment and precise sublimation control for novel material discovery. |
| Thermal Stress Testing | Subjecting material samples to rapid temperature fluctuations to evaluate durability and expansion characteristics. | High heating and cooling rates allow for intense thermal shock simulation. |
| Phase Transition Studies | Monitoring material changes through precise temperature ramps and holds in a controlled gaseous environment. | Real-time data logging provides accurate mapping of phase transition points. |
Technical Specifications
| Parameter Group | Specification Detail | Value for TU-RT30 |
|---|---|---|
| Model Identifier | Item Number | TU-RT30 |
| Chamber Construction | Material | High purity fused quartz tube |
| Tube Dimensions | 11" OD / 10.8" ID x 9" H | |
| Frame & Structure | Frame Material | Mobile aluminum alloy with integrated controls |
| Overall Dimensions | 850(L) × 745(W) × 1615(H) mm | |
| Heating Performance | Max. Temperature | ≤ 650ºC for each heater |
| Max. Temp Difference | Spacing 30mm: 315ºC; Spacing 40mm: 350ºC; Spacing 50mm: 395ºC | |
| Heating Rate | < 8ºC/s (Single heater); System Max up to 20ºC/s | |
| Cooling Rate | < 10ºC/s (From 600ºC to 100ºC) | |
| Control System | Controllers | Dual 30-segment programmable PID controllers |
| Accuracy | +/- 1ºC | |
| Interface | RS485 port with PC software included | |
| Vacuum System | Flange Material | Stainless Steel 316 with double silicone O-rings |
| Vacuum Level | 10E-2 Torr (Mechanical Pump); 10E-5 Torr (Molecular Pump) | |
| Ports | KFD-25 vacuum ports; 1/4" pipe gas inlets/outlets | |
| Atmosphere Control | Gas Flow Meters | Two float meters: 16-160 mL/m and 400-4000 mL/m |
| Thermal Insulation | Carbon fiber felt | |
| Electrical Specs | Working Voltage | 208 - 240VAC, Single Phase, 20A breaker |
| Power Requirement | 2200W total (1100W per heater) | |
| Sample Handling | Holder Capacity | 3" round wafer or 2" x 2" square substrate |
| Uniformity Aids | High thermal conductive AlN plate (3" Dia x 0.5mm) | |
| Compliance | Certification | CE Certified (NRTL/CSA available upon request) |
Why Choose TU-RT30
- Unmatched Thermal Precision: This system delivers the exacting temperature control required for the most sensitive sublimation processes. The dual-zone PID synchronization ensures that the temperature gradient remains stable throughout the entire deposition cycle, which is critical for achieving consistent film stoichiometry and morphology.
- Optimized for Rapid R&D Cycles: Unlike traditional furnaces that take hours to ramp and cool, this unit's halogen-based rapid thermal processing allows for multiple experimental runs per day. This significantly accelerates the development timeline for researchers working on fast-moving technologies like perovskite solar cells.
- Industrial-Grade Vacuum Integrity: With SS316 flanges and high-purity quartz, this system maintains a clean-room quality environment. The robust sealing and precision vacuum monitoring protect your valuable samples from contamination, ensuring that experimental results are purely a reflection of the material properties, not environmental interference.
- Flexible and Scalable Architecture: The adjustable heater spacing and universal substrate holder make this equipment adaptable to a wide range of material systems. Whether you are transitioning from 1-inch samples to 3-inch wafers, the system scales with your research needs without requiring expensive re-tooling.
- Comprehensive Safety and Support: Built with high-temperature alarms, water-cooled protection, and CE-certified components, the system prioritizes operator safety and equipment longevity. THERMUNITS provides full technical support to ensure your system is optimized for your specific application from day one.
For researchers and procurement teams seeking a reliable, high-performance solution for thin-film material science, this system represents a premier investment in operational consistency and precision engineering. Contact us today for a technical consultation or a formal quotation tailored to your facility requirements.
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