Tube Furnace
1200C High Temperature Vertical Sliding Furnace with Rapid Thermal Processing and Vacuum Tube Hybrid Capabilities
Item Number: TU-C04
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Product Overview

This high-performance thermal processing system represents a significant leap in laboratory furnace versatility, combining the robust volume of a traditional muffle box furnace with the precision atmosphere control of a vacuum tube system. Engineered for demanding material research, the equipment provides an optimized environment for sintering, annealing, and chemical vapor deposition processes. Its unique design allows researchers to bridge the gap between bulk material processing and specialized controlled-atmosphere experiments within a single, integrated platform.
The core value of this system lies in its ability to facilitate Rapid Thermal Processing (RTP). By utilizing a vertical sliding mechanism, the unit can achieve heating and cooling rates that far exceed standard laboratory furnaces, making it an indispensable tool for material scientists studying phase transitions and quenching kinetics. This equipment is designed for use in industrial R&D centers, semiconductor laboratories, and advanced metallurgy facilities where precision and repeatability are paramount.
Built with industrial-grade components and a focus on long-term operational stability, this furnace ensures consistent performance under rigorous duty cycles. The high-purity alumina fiber insulation and advanced heating elements are selected to provide maximum energy efficiency while maintaining superior temperature uniformity. This unit offers the reliability and technical sophistication required for critical research where even minor thermal deviations can compromise experimental integrity.
Key Features
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Integrated Rapid Thermal Processing (RTP) Mechanism: The system features a specialized rear-mounted moving assembly that allows the vacuum-sealed processing tube to be instantly inserted into or removed from the preheated heating zone. This engineering enables heating and cooling rates of approximately 1°C per second, essential for quenching applications and metastable phase studies.
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Dual-Mode Operational Versatility: This equipment functions as both a 4.2-liter box furnace and a high-vacuum tube furnace. The top-access port accommodates interchangeable quartz tubes, allowing users to switch from air-atmosphere processing of bulk ceramics to high-purity gas-controlled treatment of thin films without the need for separate thermal units.
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Precision PID Temperature Control: An advanced digital controller utilizes Proportional-Integral-Derivative logic with an auto-tune function to maintain ±1.0 °C stability. With 30 programmable segments for ramping, dwelling, and cooling, the unit provides total control over complex thermal profiles.
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High-Purity Quartz Vacuum Environment: Optional 50mm or 80mm OD quartz tubes with stainless steel vacuum flanges allow for processing under high vacuum or controlled inert gas atmospheres. This ensures the protection of sensitive materials from oxidation and contamination during high-temperature cycles.
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Robust Safety and Monitoring Systems: The furnace is equipped with built-in over-temperature alarms and thermocouple failure protection. The K-type thermocouples are protected by ceramic sheaths to ensure long-term accuracy and durability even when operating at the maximum rated temperature of 1200°C.
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Enhanced Atmosphere Control: The vacuum flanges include built-in KF16 ports for digital vacuum gauges and 1/4" needle valves for precise gas inlet management. This allows for meticulous control over the internal environment, supporting processes like inert gas purging or reactive atmosphere synthesis.
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High-Efficiency Insulation and Heating: Utilizing premium alumina fiber insulation and high-quality heating elements, the system achieves a standard heating rate of 30°C per minute while minimizing heat loss to the exterior casing, ensuring a safer laboratory environment and lower energy consumption.
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PC Connectivity and Data Logging: A default DB9 communication port and specialized software enable remote PC operation and real-time data acquisition, allowing researchers to document and analyze thermal cycles for compliance and quality control.
Applications
| Application | Description | Key Benefit |
|---|---|---|
| Semiconductor Annealing | Rapid thermal processing of silicon wafers and thin-film electronics to activate dopants. | Fast ramp rates prevent unwanted diffusion while ensuring crystalline integrity. |
| Quenching Studies | Rapidly cooling metal alloys or advanced ceramics from high temperatures to room temperature. | Vertical lift mechanism allows for 1°C/S cooling to freeze metastable microstructures. |
| Chemical Vapor Deposition (CVD) | Utilizing the vacuum tube mode to deposit high-purity coatings onto substrates. | Precise atmosphere control and vacuum stability ensure uniform film thickness. |
| Sintering of Advanced Ceramics | High-temperature processing of technical ceramic components in the box furnace chamber. | Superior temperature uniformity leads to consistent material density and strength. |
| Battery Material Synthesis | Calcinating cathode or anode powders under controlled inert gas to prevent oxidation. | Dual-mode capability allows for transition from powder synthesis to tube-based testing. |
| Metallurgy Research | Testing the thermal stress and phase transformations of new alloy compositions. | Programmable 30-segment control allows for complex, multi-stage heat treatment cycles. |
| Dental Material Processing | High-temperature firing of zirconia and other dental ceramics in a clean environment. | High-purity chamber materials prevent contamination and discoloration of aesthetics. |
Technical Specifications
| Parameter | TU-C04-2 (2" Tube Variant) | TU-C04-3 (3" Tube Variant) |
|---|---|---|
| Maximum Temperature | 1200 °C (Air/Inert), 1000 °C (Vacuum) | 1200 °C (Air/Inert), 1000 °C (Vacuum) |
| Continuous Working Temp | 100 °C - 1200 °C | 100 °C - 1200 °C |
| Chamber Dimensions | 150mm(D) x 155mm(W) x 180mm(H) | 150mm(D) x 155mm(W) x 180mm(H) |
| Chamber Capacity | 4.2 Liters (0.44 cubic ft) | 4.2 Liters (0.44 cubic ft) |
| Heating Rate (Standard) | 30 °C / minute | 30 °C / minute |
| RTP Heating/Cooling Rate | ~ 1 °C / second | ~ 1 °C / second |
| Temperature Stability | ± 1.0 °C | ± 1.0 °C |
| Thermocouple Type | K-type with Ceramic Sheath | K-type with Ceramic Sheath |
| Quartz Tube Dimensions | 50 OD x 44 ID x 263 L (mm) | 80 OD x 73 ID x 263 L (mm) |
| Vacuum Connection | KF16 Port | KF16 Port |
| Gas Connection | 1/4" Needle Valve | 1/4" Needle Valve |
| Power Supply | 208-240V Single Phase, 50/60 Hz | 208-240V Single Phase, 50/60 Hz |
| Maximum Power | 2.5 KW | 2.5 KW |
| Temperature Controller | 30-Segment PID with Auto-tune | 30-Segment PID with Auto-tune |
| Compliance | CE Certified (NRTL/CSA Optional) | CE Certified (NRTL/CSA Optional) |
Why Choose Us
- Unmatched Process Flexibility: The ability to switch between a large-volume box furnace and a high-vacuum tube furnace within minutes provides unparalleled value for multi-disciplinary research labs.
- Superior Thermal Management: Our Rapid Thermal Processing mechanism is engineered for precision and speed, allowing users to perform complex quenching and fast-heating protocols that standard furnaces cannot handle.
- Precision Engineering and Build Quality: From the high-purity alumina insulation to the stainless steel vacuum flanges, every component is selected for its ability to withstand extreme thermal stress and provide years of reliable service.
- Comprehensive Control and Safety: The combination of a 30-segment PID controller and integrated safety alarms ensures that your experiments are not only precise but also secure against hardware failures or temperature overshoots.
- Expert Technical Support: THERMUNITS provides deep technical expertise and customization options to ensure this equipment meets the specific demands of your industrial or academic research.
Contact our technical sales team today for a detailed quote or to discuss a custom thermal processing solution tailored to your specific material requirements.
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