RTP Furnace
1200C Sliding Tube Furnace for Rapid Thermal Processing and CVD Graphene Growth with 100mm OD Capacity
Item Number: TU-RT14
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Product Overview


This high-performance thermal processing system is engineered for advanced material science research, specifically designed to meet the rigorous demands of Rapid Thermal Processing (RTP) and Chemical Vapor Deposition (CVD). By integrating a motorized sliding mechanism with a high-temperature tube furnace, the equipment allows for instantaneous transitions between heating and cooling zones. This capability is essential for researchers working on thin-film growth, semiconductor doping, and the synthesis of high-purity nanostructures where precise thermal history is critical to the material's final properties.
Optimized for versatility and scalability, the system is a primary choice for laboratories specializing in the CVD growth of graphene, carbon nanotubes, and other two-dimensional materials. The sliding rail design facilitates ultra-fast heating and quenching rates, which are often impossible to achieve in stationary furnace configurations. This unit provides the agility required to explore new material phases and optimize growth parameters with high reproducibility across various atmospheric conditions, including vacuum and low-pressure environments.
Built with industrial-grade components and a focus on long-term reliability, the equipment ensures consistent performance even under demanding R&D schedules. The robust mechanical structure, combined with advanced PLC logic, provides a stable platform for complex thermal cycles. Whether utilized in academic research or industrial product development, this system offers the precision, safety features, and structural integrity needed to drive innovation in high-temperature material processing and semiconductor engineering.
Key Features
- Precision Motorized Sliding Mechanism: The system is equipped with a high-accuracy sliding rail that allows the furnace body to move rapidly along the tube axis. This enables the specimen to remain stationary while the thermal environment changes instantly, facilitating cooling rates up to 3°C per second and mimicking industrial-scale rapid thermal annealing processes.
- Advanced PLC and Touch Screen Interface: A sophisticated Programmable Logic Controller (PLC) with an intuitive touch screen interface manages all operational parameters. Users can easily adjust sliding speeds, set automated movement sequences, and synchronize furnace motion with specific temperature program segments for fully hands-free operation.
- Optimized Rapid Thermal Processing (RTP): Designed specifically for RTP applications, the unit can achieve a maximum heating rate of 10°C/min and exceptionally fast quenching. The ability to slide the heated zone away from the sample area allows for rapid cooling from 500°C to 100°C at rates as high as 3°C/s, which is vital for preserving metastable phases in advanced alloys.
- Integrated CVD Growth Capabilities: The system's thermal and atmospheric control makes it an ideal platform for the CVD growth of graphene and carbon nanotubes. The precise control over gas flow, temperature uniformity within the 400mm heating zone, and rapid cycle times significantly improve the throughput and quality of nanomaterial synthesis.
- Robust Vacuum and Atmosphere Sealing: Featuring stainless steel vacuum flanges with double O-ring seals and threaded compression, the equipment maintains high vacuum integrity. It supports vacuum levels down to 10^-5 torr (with a molecular pump), making it suitable for oxygen-sensitive processes and high-purity atmosphere control.
- Dual PID Temperature Control: The thermal management system utilizes two automatic PID controllers with 50 programmable segments. This ensures ±1°C accuracy and prevents temperature overshoot, protecting sensitive samples and ensuring the repeatability of experimental results across various dwell times and ramp rates.
- Comprehensive Safety Protections: Engineering excellence is reflected in the built-in safety protocols, including overheating protection and thermocouple breakage alerts. The mechanical sliding range is governed by precise limit switches to prevent hardware interference, ensuring safe operation during high-speed movements.
- Flexible Tube Configuration Support: The furnace is designed to accommodate a wide range of quartz tube diameters, from 25mm to 100mm OD. This flexibility allows researchers to scale their experiments from small-sample feasibility tests to larger-scale batch processing without changing the core thermal unit.
- Enhanced Data Logging and PC Connectivity: For detailed process analysis, the equipment includes a DB9 PC communications port and an MTS-02 control module. This allows for remote monitoring, data acquisition, and complex profile programming via a connected computer, essential for documenting R&D iterations.
Applications
| Application | Description | Key Benefit |
|---|---|---|
| Graphene Synthesis | Large-area graphene growth on copper or nickel foils using CVD techniques. | Rapid cooling preserves monolayer quality and prevents multilayer formation. |
| Carbon Nanotubes (CNTs) | Controlled growth of single-walled and multi-walled CNTs on various substrates. | Precise thermal ramps ensure uniform tube diameter and high-yield synthesis. |
| Rapid Thermal Annealing | Post-deposition annealing of semiconductor wafers to activate dopants or repair crystal damage. | High-speed sliding mechanism provides the necessary rapid thermal quench. |
| Thin Film Deposition | Creation of functional thin films for solar cells or electronic sensors. | Integrated gas handling and vacuum control provide high-purity film environments. |
| Phase Transformation Studies | Investigating the kinetics of material phase changes under controlled heating and cooling. | Rapid sliding allows for immediate freezing of high-temperature microstructures. |
| Semiconductor Doping | High-temperature diffusion of impurities into semiconductor substrates. | Uniform 400mm heating zone ensures consistent doping profiles across the sample. |
| Materials Quenching | Testing the heat treatment response of advanced alloys and ceramics. | Achieves cooling rates comparable to specialized quenching oils without contamination. |
Technical Specifications
| Parameter Group | Specification Detail | Value / Range |
|---|---|---|
| Model Identification | Product Item Number | TU-RT14 |
| Electrical Power | Input Voltage | AC 208-240V, Single Phase, 50/60 Hz |
| Rated Power | 3 kW | |
| Thermal Performance | Maximum Temperature | 1200°C (for < 0.5 hours) |
| Continuous Working Temperature | 1100°C or less | |
| Recommended Heating Rate | ≤ 10°C/min | |
| Max Heating Rate (Left Sample Area) | 3°C/s | |
| Rapid Cooling Rate (500-100°C) | 3°C/s | |
| Rapid Cooling Rate (500-200°C) | 0.7°C/s | |
| Heating Zone | Heating Zone Length | 400 mm |
| Thermocouple Type | K-type | |
| Mechanical Features | Slide Distance | 400 mm (Standard, customizable) |
| Adjustable Speed Range | 10-100 mm/s (Standard, customizable) | |
| Motion Control | Automated/Programmable back-and-forth sliding | |
| Temperature Control | Controller Type | Dual PID with 50 programmable segments |
| Accuracy | ± 1 ºC | |
| Protection Systems | Overheating & Thermocouple Broken Protection | |
| Communication Interface | DB9 PC Port (MTS-02 module included) | |
| Vacuum & Atmosphere | Flange Material | Stainless Steel with Double O-ring seals |
| Vacuum Interface | Left: KF25, Needle valve, Barb venting port | |
| Inlet/Gauge | Right: Needle valve, G1/4 inlet, Mechanical gauge | |
| Vacuum Level (Mechanical Pump) | ~10^-2 Torr | |
| Vacuum Level (Molecular Pump) | ~10^-5 Torr | |
| Quartz Tube Options | Standard Length | 1400 mm |
| Diameter Variants (O.D.) | 25mm, 50mm, 60mm, 80mm, 100mm | |
| Compliance | Standards | CE Certified (NRTL/UL61010 available) |
Why Choose This Sliding Tube Furnace
- Proven Engineering Reliability: Built for the most demanding R&D environments, the furnace utilizes premium grade heating elements and a reinforced motorized rail system, ensuring thousands of cycles without degradation in precision or performance.
- Superior Thermal Agility: Unlike standard tube furnaces that rely on slow natural convection cooling, this system’s sliding design provides the thermal shock and rapid quenching capabilities necessary for cutting-edge materials engineering and semiconductor research.
- Fully Integrated Control Logic: The seamless integration between the PID temperature controllers and the PLC motion system allows for complex, multi-stage recipes that would otherwise require manual intervention and risk human error.
- Unmatched Versatility: From CVD graphene growth to rapid thermal annealing, the equipment supports a vast array of experimental setups with its wide range of tube diameters and high vacuum compatibility, making it a future-proof investment for any laboratory.
- Global Compliance and Support: With CE certification and the option for NRTL/CSA upgrades, our equipment meets the strictest safety standards for international research institutions and industrial facilities, backed by our responsive technical support team.
Please contact our technical sales team today for a comprehensive quote or to discuss a customized thermal solution tailored to your specific research requirements.
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