1200°C 10-Zone Split Tube Furnace with Horizontal and Vertical Mounting for Multi-Zone Thermal Gradients and Large Diameter Material Processing

Tube Furnace

1200°C 10-Zone Split Tube Furnace with Horizontal and Vertical Mounting for Multi-Zone Thermal Gradients and Large Diameter Material Processing

Item Number: TU-C10

Maximum Operating Temperature: 1200°C Heating Zone Configuration: 10 Independent Zones (1470mm Total Length) Mounting Configuration: Dual Horizontal and Vertical Positions
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Product Overview

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This high-performance thermal processing system represents the pinnacle of multi-zone furnace engineering, designed specifically to meet the rigorous demands of material science research and industrial pilot production. By integrating ten independently controlled heating zones into a single, robust split-tube architecture, this equipment provides researchers with the unique ability to establish complex temperature gradients or maintain an exceptionally long uniform thermal field. The dual-axis design allows for both horizontal and vertical operation, making it an incredibly versatile asset for laboratories working on diverse projects from vapor transport to vertical crystal growth.

Built for advanced material synthesis and thermal profiling, this system excels in environments where precision and reproducibility are non-negotiable. Whether utilized for Chemical Vapor Deposition (CVD), annealing of semiconductor wafers, or simulating industrial-scale heat treatment processes in a controlled laboratory setting, the equipment delivers consistent performance. The split-furnace design facilitates rapid cooling and easy access to the processing tube, streamlining the experimental workflow and increasing the throughput of critical research projects in high-temperature material science.

Reliability is at the core of this thermal platform’s design. Engineered with industrial-grade components and a sophisticated control interface, the system ensures stable operation even during extended high-temperature cycles. The structural integrity of the furnace housing combined with the precision of the integrated thermocouples provides the confidence needed for sensitive industrial R&D. By offering a large diameter processing capability and a massive total heating length, this unit bridges the gap between small-scale laboratory experiments and industrial-grade material production, ensuring that your research translates effectively to larger scales.

Key Features

  • Independent Ten-Zone Thermal Architecture: The system utilizes ten discrete heating zones, each measuring 120mm in length and separated by 30mm barriers. This configuration allows for the creation of precise, non-linear temperature profiles or the establishment of a remarkably long uniform heating zone exceeding 1000mm at 800°C, providing unmatched flexibility for complex thermal processing.
  • Dual-Axis Configuration Versatility: Engineered with a flexible mounting system, the unit can be operated in both horizontal and vertical orientations. This adaptability is crucial for specialized applications such as Bridgman crystal growth or horizontal vapor phase transport, ensuring the equipment can evolve with changing research requirements.
  • Advanced PID Control Logic: Each of the ten zones is governed by an independent high-precision temperature controller featuring 50 programmable segments. The integrated PID loop maintains a temperature fluctuation of less than 1°C, delivering the exacting stability required for sensitive material synthesis and repeatable industrial simulations.
  • Robust Split-Tube Design: The furnace features a split-opening mechanism that allows for rapid loading and unloading of samples, as well as faster cooling rates after processing. This design also simplifies the replacement of the high-purity alumina processing tubes and the inspection of thermal elements.
  • High-Capacity Processing Environment: With a standard processing tube diameter of 100mm and a total heating length of 1470mm, this system is capable of handling large-scale samples or high-volume batches, significantly increasing the productivity of material research departments and industrial labs.
  • Precision Atmosphere Control: Equipped with heavy-duty stainless steel flanges and ISO100-K ports, the system supports high-vacuum operations down to 5e-2 torr and precise gas delivery via 1/4" compression fittings. This enables researchers to maintain strict control over the atmosphere, whether inert, oxidizing, or under vacuum.
  • Comprehensive Thermal Monitoring: Ten K-type thermocouples are strategically positioned to provide real-time feedback for each zone. This extensive monitoring capability ensures that any thermal drift is instantly corrected, maintaining the integrity of the established temperature gradient across the entire 1470mm heating length.
  • Industrial Communication Integration: An RS-485 serial port is included for remote communication and data logging. This allows for centralized control via a PC, enabling researchers to monitor cycles, store complex thermal recipes, and ensure complete traceability of all thermal processing parameters.

Applications

Application Description Key Benefit
Physical Vapor Transport (PVT) Establishing steep gradients for the growth of high-purity crystals and 2D materials. Precise control over sublimation and deposition rates.
Chemical Vapor Deposition (CVD) Large-scale coating and material synthesis under controlled gas flow and vacuum. High uniformity over large surface areas for consistent film quality.
Industrial Process Simulation Mimicking continuous industrial conveyor furnaces in a batch-style laboratory setup. Accurate scaling of thermal recipes from lab to factory floor.
Solid-State Battery Research High-temperature sintering and annealing of ceramic electrolytes and electrode materials. Uniform thermal distribution ensures structural integrity of battery components.
Vertical Bridgman Growth Utilizing the vertical orientation to move a crucible through a controlled temperature gradient. Optimized conditions for single-crystal growth and solidification studies.
Semiconductor Annealing Rapid or controlled thermal processing of silicon or compound semiconductor wafers. Exceptional stability prevents thermal stress and defects in the substrate.
Catalyst Testing High-throughput evaluation of catalyst performance across varying temperature zones. Simultaneous testing of multiple parameters within a single cycle.

Technical Specifications

Parameter Specifications for TU-C10
Model Identification TU-C10
Maximum Temperature 1200°C
Continuous Operating Temperature 1100°C
Heating Zone Configuration 10 Independent Zones
Each Zone Length 120 mm
Zone Separator Length 30 mm
Total Heating Length 1470 mm
Uniform Heating Length <1000 mm @ 800°C ± 2°C
Processing Tube Dimensions Ø100 × Ø92 × 2000 mm (Other sizes available)
Mounting Orientation Horizontal and Vertical
Temperature Control 10x PID controllers, 50 programmable segments each
Temperature Accuracy ± 1 ºC
Thermocouple Type 10x K-type
Vacuum Capability 5e-2 torr (with mechanical pump)
Maximum Pressure < 3 psig
Flange Design Stainless steel with ISO100-K port and KF25 vacuum port
Gas Inlet/Outlet 1/4" compression tube fittings
Power Requirements 208-240VAC, 3 Phase, 50/60 Hz, 40 A
Maximum Power Consumption 14 kVA
Communication Interface RS-485 Serial Port
Compliance Standards CE Certified (NRTL/UL/CSA available upon request)

Why Choose TU-C10

  • Unmatched Gradient Flexibility: The ten-zone design provides the most granular control over thermal profiles currently available in a laboratory furnace, allowing for sophisticated material synthesis that simpler systems cannot achieve.
  • Engineered for Reliability: Utilizing high-grade thermal elements and advanced insulation materials, this system is built for longevity and operational consistency in the most demanding industrial research environments.
  • Versatile Dual-Orientation Chassis: The ability to switch between horizontal and vertical configurations eliminates the need for multiple specialized furnaces, providing a cost-effective and space-saving solution for multi-disciplinary labs.
  • Precision and Stability: With a PID loop that maintains accuracy within ±1°C, researchers can be confident that their thermal profiles are executed with absolute precision, ensuring repeatable results every time.
  • Full Customization and Support: We provide comprehensive customization options, including specialized tube diameters and atmosphere control systems, backed by our responsive technical support team.

Our engineering team is ready to help you configure this advanced thermal platform for your specific material research needs; contact us today for a technical consultation and a formal quotation.

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