RTP Furnace
1200C Tube Furnace with Internal Magnetic Sample Sliding for Direct Vaporizing Deposition and Rapid Thermal Processing
Item Number: TU-RT02
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Product Overview
This high-precision thermal processing system is engineered for advanced material science research, specifically targeting the complex requirements of Direct Vaporizing Deposition (DVD) and Rapid Thermal Processing (RTP). By integrating a manual magnetic sample sliding mechanism, the equipment allows for the precise positioning of samples within the heating zone without compromising the vacuum or atmospheric integrity of the process. This capability is essential for researchers working with 2D materials, thin-film deposition, and thermal annealing where transitional temperature phases must be controlled with extreme accuracy.
The equipment is designed to operate at temperatures up to 1200°C, providing a robust platform for high-temperature synthesis and industrial R&D. Its compact 2-inch tube design makes it an ideal fit for laboratory environments that require high performance within a limited footprint. Target industries include semiconductor manufacturing, nanotechnology, and advanced ceramics, where the ability to manipulate sample position relative to a stable thermal gradient is a critical factor in achieving repeatable experimental results.
Built with industrial-grade components and a focus on long-term reliability, this unit ensures consistent performance under demanding conditions. The combination of a high-conductivity alumina sample holder, a NIST-certified temperature monitor, and a sophisticated PID control system provides operators with the confidence needed for sensitive material growth. Whether used for synthesis in a controlled atmosphere or high-vacuum environment, the system delivers the thermal stability and mechanical precision necessary for modern material characterization and production workflows.
Key Features
- Innovative Magnetic Sample Travel: The system utilizes an internal travel mechanism driven by external magnets, allowing the sample holder to move smoothly across the heating zone. This enables precise control over deposition rates and thermal exposure without breaking the vacuum seal.
- High-Conductivity Alumina Sample Holder: The equipment features a flat sample holder designed for optimal thermal contact, ensuring that the temperature monitored via the integrated K-type thermocouple reflects the actual state of the sample with high fidelity.
- Precision NIST-Certified Monitoring: Each unit is equipped with a NIST-certified precision temperature monitor connected via a dedicated vacuum feedthrough, providing an extra layer of verification for mission-critical research and compliance.
- Advanced 30-Segment Programmable PID Control: The temperature controller allows for complex thermal profiles, including ramp, soak, and cool-down cycles, with built-in protections against over-temperature and thermocouple failure to safeguard the equipment.
- Dual-Zone Atmospheric Flexibility: Designed for operation under vacuum or low-pressure atmospheres, the system is compatible with various gases, making it versatile for CVD, DVD, and other chemical vapor processes.
- Robust Heating Element Composition: Utilizing high-quality Fe-Cr-Al alloy doped with Molybdenum, the heating elements are engineered for high-temperature longevity and rapid response times, maintaining a maximum temperature of 1200°C.
- Optimized Thermal Insulation: High-purity fibrous ceramic tube blocks are utilized to minimize heat radiation toward the vacuum flanges, protecting the seals and ensuring a stable temperature profile within the work zone.
- Modular Vacuum Integration: The standard KF25 vacuum port and 1/4" barb fittings allow for quick integration with mechanical or turbo pumps, facilitating rapid evacuation and clean processing environments.
Applications
| Application | Description | Key Benefit |
|---|---|---|
| 2D Material Growth | Synthesis of Graphene, MoS2, and other transition metal dichalcogenides using controlled vapor deposition. | Precise sample movement allows for specific nucleation and growth rates. |
| Rapid Thermal Processing | Subjecting semiconductor wafers to quick heating and cooling cycles to activate dopants or change film properties. | Magnet-driven sliding enables rapid transition between hot and cold zones. |
| Direct Vaporizing Deposition | Vaporizing solid precursors at high heat and depositing them onto a substrate positioned at a cooler gradient. | Accurate sample positioning within the thermal gradient optimizes film quality. |
| Thin Film Annealing | Post-deposition heat treatment of thin films to improve crystallinity and electrical properties. | Consistent PID control ensures uniform crystal structure across the substrate. |
| Catalyst Research | Testing and activating catalytic materials under varied gas atmospheres and high temperatures. | High vacuum and atmosphere control allow for clean, repeatable reaction environments. |
| Ceramic Sintering | High-temperature processing of small-scale ceramic components or powders. | Stable 1200°C capability provides the heat necessary for dense material formation. |
Technical Specifications
| Specification Category | Parameter Details (TU-RT02) |
|---|---|
| Model Identifier | TU-RT02 |
| Power Supply | 110VAC or 208-240 VAC, 50/60Hz (1.5 KW) |
| Maximum Temperature | 1200°C (< 1 hour duration) |
| Continuous Temperature | 1100°C |
| Heating Rate | ≤ 20°C per minute |
| Heating Zone Length | 8" (200mm) Single Zone |
| Constant Temperature Zone | 2.3" (60mm) within ±1°C @ 1000°C |
| Temperature Controller | PID automatic control, 30-step programmable, SSR drive |
| Temperature Accuracy | ± 1°C |
| Heating Elements | Fe-Cr-Al Alloy doped by Mo |
| Processing Tube | High-purity Quartz; 50mm O.D x 44mm I.D x 1000mm L |
| Sample Holder | Alumina Flat Holder (2" L x 1" W) with K-type Thermocouple |
| Travel Mechanism | Magnetic manual sliding mechanism with internal/external magnet coupling |
| Vacuum Flanges | 2" Stainless Steel with KF25 port, 1/4" Bard fittings, and 1/4" Feedthrough |
| Vacuum Level | 10^-2 torr via standard mechanical pump |
| Compliance | CE Certified (NRTL/CSA available upon request) |
| Dimensions & Safety | Includes built-in over-temp protection and thermocouple failure alarms |
Why Choose Us
Investing in this thermal processing system ensures your facility is equipped with a tool designed for the rigors of modern nanotechnology and material synthesis. The primary advantage of the internal travel mechanism is the elimination of the need to break vacuum during sample translation, which dramatically increases experiment throughput and prevents sample contamination. Our engineering team has prioritized thermal precision, utilizing NIST-certified components to ensure that the data you collect is both accurate and publishable.
Beyond technical specifications, this furnace is built for longevity. The combination of high-grade quartz, molybdenum-doped alloy elements, and robust stainless steel flanges ensures that the system maintains its performance over years of continuous operation. Furthermore, the modular nature of the vacuum and gas delivery ports allows for future scalability, whether you are adding multi-channel gas mixers or advanced PC-based control modules. Choosing this equipment means choosing a partner in your research, backed by a commitment to technical excellence and responsive customer support.
Contact our technical sales team today for a comprehensive quote or to discuss a custom solution tailored to your specific process requirements.
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