1100°C Large Diameter Quartz Tube Furnace with 24 Inch Heating Zone and Water Cooled Flanges

Tube Furnace

1100°C Large Diameter Quartz Tube Furnace with 24 Inch Heating Zone and Water Cooled Flanges

Item Number: TU-28

Maximum Temperature: 1100°C Processing Tube Diameter: 8.5" OD (216mm) Heating Zone Length: 600 mm (24")
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Product Overview

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This high-performance thermal processing system is engineered to meet the rigorous demands of material science research and industrial pilot production. Featuring a significant 8.5-inch diameter quartz processing tube, the equipment is designed for Chemical Vapor Deposition (CVD) processes involving large-scale samples or semiconductor wafers. Its robust architecture and expansive heating zone provide the thermal uniformity necessary for complex material transformations, ensuring that every batch meets stringent quality standards.

In the landscape of modern R&D, this system serves as a versatile platform for the synthesis of advanced materials, including nanomaterials and thin films. By integrating a high-purity quartz chamber with precision-controlled heating elements, the unit maintains a clean-room quality environment even at elevated temperatures. This makes it an indispensable tool for laboratories focusing on clean energy, electronics, and aerospace components where contamination control is as critical as temperature precision.

Reliability is at the core of this unit's design. Built with premium industrial-grade components and a dual-layer steel casing, it ensures operational consistency under demanding conditions. Whether performing continuous 24-hour cycles for long-term sintering or rapid thermal cycling for stress testing, this equipment provides the mechanical and thermal stability required for reproducible scientific results and efficient industrial workflows.

Key Features

  • Expansive 8.5-Inch Quartz Processing Tube: The high-purity fused quartz tube provides a massive processing volume suitable for large wafers or high-capacity powder calcination, ensuring maximum productivity in research environments.
  • Advanced NiCrAl Resistance Heating: High-performance NiCrAl wire elements are strategically positioned to provide efficient heat transfer and a maximum operating temperature of 1100°C with exceptional longevity.
  • Precision PID Temperature Regulation: The integrated programmable controller allows for up to 30 distinct heating and cooling segments, providing granular control over the thermal profile to prevent overshoot and maintain ±1°C accuracy.
  • Water-Cooled Stainless Steel Flanges: High-integrity hinged flanges include integrated water cooling channels, which protect the hermetic seals during high-temperature runs and ensure vacuum levels are maintained throughout the process.
  • Double-Layer Steel Casing with Fan Cooling: The external furnace structure is designed with a protective air gap and active cooling fans, keeping the outer surface temperature below 70°C for operator safety and equipment durability.
  • High-Purity Alumina Fibrous Insulation: The use of premium alumina-silicate fibrous insulation maximizes thermal retention and energy efficiency, reducing power consumption while protecting internal components from heat fatigue.
  • Dual Thermocouple Monitoring System: A dual K-type thermocouple configuration provides separate channels for temperature control and safety monitoring, featuring an over-heating and broken thermocouple alarm for fail-safe operation.
  • Versatile Atmosphere Management: Equipped with a 1/4" compression tube gas inlet/outlet and KF25 vacuum ports, this system allows for precise control of internal pressure and atmosphere composition during heat treatment.

Applications

Application Description Key Benefit
CVD / PECVD Processes Synthesis of thin films and nanomaterials on large diameter substrates and wafers. High purity and uniform gas distribution.
Carbon Graphitization Structural ordering of nitrogen-doped carbon for enhanced electrical conductivity in catalysts. Stability of Co-N cluster sites at 1100°C.
Semiconductor Annealing High-temperature thermal treatment of silicon or compound semiconductor wafers to repair crystal defects. Large diameter tube accommodates industrial wafers.
Catalyst Synthesis Optimization of cobalt and nitrogen cluster sites for improved methanol tolerance in fuel cells. Precise temperature control for uniform clusters.
Ceramic Sintering Consolidation of technical ceramic powders into high-density industrial components. Excellent thermal shock resistance of quartz tube.
Powder Calcination Thermal decomposition and purification of chemical precursors in a controlled atmosphere. Expansive heating zone for high batch yield.
Solid State Battery R&D Processing of electrolyte materials and electrodes under high-purity protective gas environments. Robust hermetic sealing for atmosphere control.

Technical Specifications

Parameter Category Specification Detail Value / Metric
Model Identifier Product Item Number TU-28
Power Supply Operating Voltage 208 - 240VAC, 50/60 Hz
Rated Power 8 kVA (50 A)
Temperature Performance Max. Heating Temperature 1100°C
Continuous Working Temp 400°C - 1050°C
Max. Heating Rate 20°C/min
Recommended Heating Rate <10°C/min
Heating Zone Total Heating Zone Length 600 mm (24")
Constant Temp Zone 200 mm (within +/-5°C)
Processing Tube Material High Purity Fused Quartz
Dimensions 216mm OD x 208mm ID x 1020mm L
Control System Controller Type Programmable PID (30 segments)
Temperature Accuracy +/-1°C
Thermocouple Type Dual K-Type
Communication (Optional) LabVIEW via RS-485 (MTS03/MTS01)
Vacuum & Atmosphere Max. Working Pressure < 3 psig
Vacuum Port KF25
Gas Connections 1/4" Compression Tube
Pressure Gauge Range -0.1 to 0.15 MPa
Mechanical Design Casing Material Double-layer Steel with Cooling Fans
Flange Type Hinged Stainless Steel (Water Cooled)
Thermal Insulation Alumina-silicate fibrous blocks
Compliance Standards CE Certified (NRTL/CSA available)

Why Choose TU-28

Investing in the TU-28 system ensures your laboratory or production facility is equipped with a thermal solution that prioritizes both precision and scalability. This unit is specifically engineered for those who require more than just standard heating; it is designed for those who need a controlled, high-purity environment for large-scale material innovation. The 8.5-inch diameter tube provides a distinct competitive advantage, allowing for the transition from small-scale testing to pilot production without the need for multiple smaller units.

Our commitment to engineering excellence is reflected in the safety features and build quality of this system. From the water-cooled flanges that protect delicate vacuum seals to the double-layer casing that ensures a safe laboratory environment, every component is chosen for its durability. By selecting this equipment, you benefit from a proven platform used by leading research institutions worldwide for graphitization, CVD, and semiconductor research.

Beyond the hardware, we provide comprehensive technical support and a range of customization options to ensure the furnace integrates seamlessly into your existing workflow. Whether you require advanced LabVIEW integration for automated data logging or specific flange modifications for unique gas delivery systems, our engineering team is ready to assist. Contact us today to request a quotation or to discuss a custom thermal solution tailored to your specific process requirements.

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