1200°C High Temperature 4 Inch Tube Furnace with Sliding Flange for CVD Systems

RTP Furnace

1200°C High Temperature 4 Inch Tube Furnace with Sliding Flange for CVD Systems

Item Number: TU-RT25

Maximum Temperature: 1200°C Tube Dimensions: 4.33" O.D x 4.05" I.D x 29.13" L Heating Zone: 440mm (Total) / 100mm (Constant)
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Product Overview

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This high-performance thermal processing system is a specialized solution designed for advanced material synthesis and chemical vapor deposition (CVD). By integrating a large-diameter quartz tube with a versatile sliding flange mechanism, the equipment provides researchers with an adaptable platform for precision heat treatment. The core value proposition lies in its ability to facilitate rapid sample transitions and maintain stable thermal environments up to 1200°C, making it a cornerstone for laboratories focused on thin-film coatings, nanotechnology, and semiconductor development.

Optimized for reliability, this unit is widely utilized across the electronics, aerospace, and energy sectors. It serves as a primary tool for developing next-generation materials like graphene and carbon nanotubes, where atmospheric control and thermal uniformity are non-negotiable. The robust construction ensures that high-purity results are achieved consistently, even when the system is subjected to repeated heating cycles under vacuum or controlled gas conditions.

Engineered for demanding R&D environments, the system prioritizes both performance and operational safety. From the precision-machined water-cooling flanges to the intelligent safety interlock mechanism, every component is selected to minimize experimental risk and maximize throughput. This equipment represents a significant investment in laboratory productivity, offering the durability required for long-term industrial research and the precision necessary for cutting-edge scientific discovery.

Key Features

  • Advanced Slidable Flange System: The right-side flange is mounted on a sliding rail assembly, allowing operators to push or pull samples in and out of the hot zone with minimal effort. This engineering choice is critical for rapid cooling requirements and significantly streamlines the sample loading process, reducing the risk of contamination or thermal shock to the quartz tube.
  • Precision PID Thermal Control: Equipped with a digital controller featuring self-tuning functionality and 30 programmable segments, the system maintains a temperature stability of ±1°C. This level of accuracy is essential for repeatable CVD growth and delicate annealing processes where even minor fluctuations can compromise material properties.
  • High-Integrity Vacuum and Gas Management: The system supports low-pressure environments and complex gas atmospheres. The left flange includes four Swagelok fittings for gas inlets, while the right flange features a KF25 vacuum port and an anti-corrosive capacitance diaphragm gauge, providing the comprehensive monitoring required for high-purity vacuum processing.
  • Integrated Water-Cooling Protection: To preserve the integrity of the sealing O-rings during high-temperature runs, the flanges are designed with internal water-cooling channels. This feature ensures that the vacuum seal remains tight even when the furnace is operating at its maximum rated temperature of 1200°C.
  • Safety-First Split Cover Design: The furnace housing features a split-cover architecture with an integrated safety interlock. If the cover is opened during operation, power to the heating elements is immediately disconnected, protecting the operator and preventing accidental damage to the internal components.
  • Optimized Constant Temperature Zone: The heating architecture is designed to provide a 100mm constant temperature zone within a 440mm total heating area. This ensures that samples are subjected to uniform thermal profiles, which is a prerequisite for achieving homogenous thin-film deposition across the substrate surface.
  • Large Diameter Processing Tube: The 4-inch (100mm ID) quartz tube allows for the processing of larger substrates or multiple samples simultaneously. This capacity is vital for research that aims to scale from small-scale discovery to pilot-level material production.
  • Intelligent Monitoring and PC Integration: With optional Labview-based software and WiFi control capabilities, users can remotely manage heat-treatment recipes, record real-time data, and plot thermal profiles, providing a digital audit trail for sensitive industrial experiments.

Applications

Application Description Key Benefit
Graphene Synthesis Thermal CVD growth of high-quality graphene layers on copper or nickel catalysts. Precise gas flow and temperature control ensure uniform lattice structures.
Carbon Nanotube (CNT) Growth Production of single-walled or multi-walled nanotubes through hydrocarbon decomposition. Slidable flange allows for rapid thermal quenching to freeze nanotube growth states.
Semiconductor Doping Diffusion of impurities into silicon or compound semiconductor wafers to alter electrical properties. 4-inch diameter accommodates standard wafer sizes for academic and industrial research.
Thin-Film Deposition Coating substrates with functional metallic or ceramic films using CVD or PECVD techniques. Vacuum integrity prevents oxidation and ensures high-purity film adhesion.
Ceramic Sintering High-temperature consolidation of advanced ceramic powders and composite materials. 1200°C capability supports a wide range of densification processes for technical ceramics.
Battery Material Annealing Heat treatment of lithium-ion battery electrode materials under inert atmospheres. Accurate PID control prevents phase separation and maintains electrochemical performance.
Solar Cell Development Processing of perovskite or thin-film solar materials under controlled atmospheric conditions. Modular flange design allows for customized feedthroughs for in-situ monitoring.
Metallurgy Research Stress relief and annealing of specialized alloy samples in a vacuum environment. Reliable cooling systems protect the equipment during long-duration heat cycles.

Technical Specifications

Parameter Category Specification Details for TU-RT25
Model Identifier TU-RT25
Tube Material & Dimensions High-purity quartz tube; 4.33" (110mm) O.D x 4.05" (103mm) I.D x 29.13" (740mm) Length
Maximum Temperature 1200°C (for durations < 30 minutes)
Continuous Working Temp 200°C to 1100°C
Heating Zone Length Total heating zone: 440 mm; Constant temperature zone: 100 mm
Heating & Cooling Rate Maximum 20°C per minute
Temperature Controller Digital PID with self-tuning; 30 programmable segments; ±1°C accuracy
Thermocouple Type K-type, inserted from right-side flange
Rated Voltage Single Phase, 220V AC, 50/60 Hz
Power Consumption Maximum 3600 W (Requires 20 A breaker)
Vacuum Fitting KF25 port on right flange; included anti-corrosive capacitance diaphragm gauge
Gas Inlet Fittings Four 1/8'' Swagelok fittings on left flange
Cooling Requirements Water-cooled flanges (12mm quick connectors); Chiller recommended
Atmospheric Limit Vacuum use up to 1000°C; Positive pressure < 0.2 bars (3 psi)
Compliance CE Certified (NRTL/CSA/TUV certification available upon request)
Safety Features Split cover with power-cut interlock protection

Why Choose Us

Choosing this thermal system represents a commitment to precision and operational efficiency. The sliding flange design is a major differentiator, offering a level of flexibility and throughput that standard fixed-tube furnaces cannot match. This makes the system ideal for high-traffic laboratories where multiple experiments must be conducted daily without compromising the integrity of the vacuum seal or the quartz tube itself.

From an engineering perspective, the system is built to withstand the rigors of industrial R&D. The use of high-grade quartz and water-cooled stainless steel components ensures long-term durability, even when operating at temperatures near the 1200°C limit. Our focus on safety, evidenced by the integrated interlock system and CE certification, provides peace of mind for facility managers and researchers alike.

Furthermore, the modular nature of the system allows for significant customization. Whether you require specific gas feedthroughs, upgraded vacuum pumps, or integrated software for remote monitoring, this unit can be tailored to meet the exact requirements of your CVD or heat treatment process. We position this equipment as a premium investment that delivers consistent, high-purity results for years to come.

Contact our technical sales team today for a formal quotation or to discuss a customized thermal solution tailored to your research objectives.

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