Chemical Vapor Deposition CVD System Slide PECVD Tube Furnace with Liquid Gasifier PECVD Machine

Product Overview

This high-performance Chemical Vapor Deposition (CVD) and Plasma Enhanced Chemical Vapor Deposition (PECVD) system represents a pinnacle in thin-film deposition technology. The equipment is specifically engineered to provide a versatile platform for synthesizing a wide variety of functional films, coatings, and nanostructures. By integrating a 500W RF plasma source with a precision slide-out tube furnace and a sophisticated liquid gasifier, this system enables the deposition of high-purity materials at lower temperatures than traditional thermal CVD processes. The core value proposition lies in its ability to deliver molecular-level control over film morphology and crystallinity while maintaining exceptional throughput through its rapid thermal cycling capabilities.

Primarily utilized in advanced research and industrial R&D environments, the equipment serves critical roles in semiconductor processing, solar cell fabrication, and materials science. It is designed to accommodate the rigorous demands of modern laboratory workflows, allowing researchers to transition seamlessly between different precursors and deposition parameters. This unit is particularly effective for developing next-generation electronics, high-efficiency photovoltaics, and specialized optical coatings where film uniformity and interface quality are paramount. The inclusion of a liquid gasifier expands its utility, allowing for the use of liquid-phase precursors which are essential for many modern organometallic and specialized chemical processes.

Reliability and performance are the cornerstones of this thermal processing system. Constructed with high-purity Japan alumina fiber insulation and robust Cr2Al2Mo2 heating elements, the system ensures consistent thermal uniformity across the entire heating zone. The integrated sliding mechanism not only facilitates rapid cooling to preserve delicate film structures but also enhances operational safety and efficiency. Every component, from the stainless steel vacuum flanges to the advanced mass flow controllers, is selected for its ability to withstand demanding industrial conditions, ensuring that the equipment delivers repeatable results over thousands of operational cycles with minimal downtime.

Key Features

• Advanced RF Plasma Source: The system incorporates a 13.56 MHz RF plasma unit with automatic matching and an adjustable output range of 5-500W. This allows for stable glow discharge and precise control over plasma density, enabling the deposition of thin films at significantly reduced substrate temperatures compared to conventional thermal methods.
• Dynamic Sliding Furnace Mechanism: The furnace chamber is mounted on a 600mm sliding track system, allowing the entire heating unit to move away from the reaction zone. This feature facilitates ultra-fast cooling rates and allows for quick access to the sample tube, drastically reducing batch cycle times and improving productivity in busy lab environments.
• High-Precision Gas Delivery: Equipped with a four-channel Mass Flow Controller (MFC) system, the equipment provides exact regulation of process gases including O2, CH4, H2, and N2. This ensures a stable and premixed gas supply, which is critical for maintaining chemical stoichiometry and achieving uniform film thickness across the substrate.
• Integrated Liquid Gasifier: The specialized liquid gasification unit allows the system to handle liquid precursors with the same precision as gaseous sources. This capability is essential for advanced CVD processes that require specific organometallic or chemical precursors not available in gas form.
• Sophisticated Thermal Control: Utilizing a PID programmable controller with a 7-inch TFT touch screen, the system maintains a temperature accuracy of ±1°C. The interface provides real-time data visualization, historical data analysis, and the ability to store complex heating profiles, ensuring repeatable process conditions.
• Premium Material Construction: The heating chamber is lined with high-purity alumina fiber from Japan, which offers superior insulation and low heat storage. This is paired with a high-purity quartz reaction tube, ensuring that the processing environment remains free from contaminants and can withstand temperatures up to 1200°C.
• Versatile Vacuum Infrastructure: The unit features high-quality stainless steel vacuum flanges with multiple ports, making it compatible with various pumping stations. Whether using a standard rotary vane pump for medium vacuum or a molecular pump for high-vacuum applications, the system maintains excellent seal integrity and low base pressures.
• Enhanced Safety Protocols: Safety is prioritized through integrated over-current and over-temperature protection. The system also includes a thermocouple failure detection mechanism and a power-failure restart function, which automatically resumes heating programs to protect valuable samples during unforeseen utility interruptions.
• Optimized Solar Cell Processing: Specifically designed graphite boat structures are available to improve the power generation output of solar cell wafers. This design effectively eliminates the common color difference issues associated with tubular PECVD processes, ensuring aesthetic and functional uniformity in photovoltaic products.

Applications

Technical Specifications

Furnace and Thermal Parameters

RF Plasma System

Gas Control and Delivery

Vacuum Performance Options

Why Choose This Product

• Superior Thermal Engineering: By combining Japan-sourced alumina fiber insulation with high-precision PID controls, this system ensures the thermal stability required for the most sensitive material growth processes.
• Operational Efficiency: The innovative sliding furnace design and automated RF matching significantly reduce the manual labor and time required for each run, making it a high-throughput solution for busy laboratories.
• Robust Safety and Reliability: With built-in protections against over-temperature, current surges, and thermocouple failure, the system is designed for long-term, unattended operation in critical research environments.
• Full Customization Capability: We offer deep customization services for the TU-PE01, including specialized gas channels, higher vacuum configurations, and custom software integration to meet your specific R&D requirements.
• Unmatched Thin Film Quality: The precision of the 4-channel MFC system and the stability of the 500W RF source ensure that every film deposited meets the highest standards of uniformity and purity.

Contact us today to discuss your specific application requirements or to receive a custom quote for your thermal processing needs.